Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | HTT | P42858 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | FABP4 | P15090 | 8/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | EP300 | Q09472 | 1/20 | 0.31 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704510 | 0.99 | ALDH1A1 (0.35) | ALDH1A1NPC1MAPK1TSHRHTT | |
| SCHEMBL3970511 | 0.89 | — | — | |
| SCHEMBL3969489 | 0.89 | HTT (0.32) | ALDH1A1TSHRHTTLMNA | |
| SCHEMBL3119750 | 0.88 | TSHR (0.42) | ALDH1A1TSHRHTTKDM4EMEN1 | |
| SCHEMBL3971506 | 0.88 | — | — | |
| SCHEMBL3970533 | 0.88 | CA1 (0.32) | KDM4E | |
| SCHEMBL3970056 | 0.88 | HTT (0.31) | ALDH1A1TSHRHTTLMNA | |
| SCHEMBL3975128 | 0.88 | MEN1 (0.32) | ALDH1A1TSHRHTTMEN1KMT2A | |
| SCHEMBL704518 | 0.87 | TSHR (0.41) | ALDH1A1TSHRHTTKDM4EMEN1 | |
| SCHEMBL36503 | 0.87 | ALDH1A1 (0.39) | ALDH1A1NPC1MAPK1IDO1FABP4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8722306-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8691496-B2 | Method for forming resist under layer film, pattern forming method and composition for resist under layer film | JSR CORPORATION (JP) | 2014-04-08 | — | — | US | disclosed |
| US-8663905-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20130004900-A1 | METHOD FOR FORMING RESIST UNDER LAYER FILM, PATTERN FORMING METHOD AND COMPOSITION FOR RESIST UNDER LAYER FILM | JSR CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-8288073-B2 | Pattern forming method | JSR CORPORATION (JP) | 2012-10-16 | — | — | US | disclosed |
| US-20120164586-A1 | PATERN FORMING METHOD | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100178608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040072094-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2004-04-15 | — | — | US | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20040034155-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| EP-1386904-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR Corporation (JP) | 2004-02-04 | — | — | EP | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |