SCHEMBL39759

SCHEMBL39759

C=CC(=O)Oc1ccc(C)cc1Cl

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.47
HPGD P15428 2/20 0.43
MRGPRX4 Q96LA9 1/20 0.42
KDM4E B2RXH2 1/20 0.41
PPARG P37231 1/20 0.39
L3MBTL1 Q9Y468 3/20 0.39
LMNA P02545 1/20 0.39
THRB P10828 2/20 0.38
THRA P10827 1/20 0.38
MAPT P10636 2/20 0.38
RAB9A P51151 1/20 0.38
ATM Q13315 1/20 0.38
NPSR1 Q6W5P4 2/20 0.38
MEN1 O00255 2/20 0.37
USP2 O75604 1/20 0.37
ALDH1A1 P00352 1/20 0.37
POLB P06746 1/20 0.37
CYP2C9 P11712 1/20 0.37
ALOX12 P18054 1/20 0.37
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL351716 0.83 KMT2A (0.60) KMT2AHPGDMRGPRX4L3MBTL1LMNA
SCHEMBL29533959 0.83 KMT2A (0.60) KMT2AHPGDMRGPRX4L3MBTL1LMNA
SCHEMBL39820 0.83 L3MBTL1 (0.47) KMT2AHPGDMRGPRX4KDM4EL3MBTL1
SCHEMBL27464291 0.83 TSHR (0.46) HPGDPPARGL3MBTL1LMNATHRB
SCHEMBL11217807 0.83 KMT2A (0.45) KMT2AHPGDTHRBTHRARAB9A
SCHEMBL30593911 0.83 L3MBTL1 (0.47) KMT2AHPGDMRGPRX4KDM4EL3MBTL1
SCHEMBL26113537 0.82 CSNK2A1 (0.47) KMT2AHPGDKDM4EL3MBTL1LMNA
SCHEMBL28239965 0.81 TRPA1 (0.41) HPGDKDM4EL3MBTL1LMNATHRB
SCHEMBL10499949 0.81 KMT2A (0.44) KMT2AMRGPRX4KDM4EL3MBTL1LMNA
SCHEMBL28326398 0.81 LMNA (0.37) HPGDKDM4EL3MBTL1LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119968374-A Cephalotaxine derivatives, pharmaceutical composition, preparation method and application thereof 南开大学 2025-05-09 CN disclosed
US-20140342576-A1 ULTRAVIOLET-CURABLE RESIN MATERIAL FOR PATTERN TRANSFER AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD USING THE SAME KABUSHIKI KAISHA TOSHIBA (JP) 2014-11-20 US disclosed
US-20140342576-A1 ULTRAVIOLET-CURABLE RESIN MATERIAL FOR PATTERN TRANSFER AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD USING THE SAME KABUSHIKI KAISHA TOSHIBA (JP) 2014-11-20 US disclosed
US-8829070-B2 Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same KABUSHIKI KAISHA TOSHIBA (JP) 2014-09-09 US disclosed
US-8829070-B2 Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same KABUSHIKI KAISHA TOSHIBA (JP) 2014-09-09 US disclosed
US-20110049089-A1 ULTRAVIOLET-CURABLE RESIN MATERIAL FOR PATTERN TRANSFER AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD USING THE SAME KABUSHIKI KAISHA TOSHIBA (JP) 2011-03-03 US disclosed
US-4835312-A Production process of N-substituted amide compounds MITSUI CHEMICALS, INCORPORATED (JP) 1989-05-30 US disclosed