SCHEMBL398650

SCHEMBL398650

C=CCOc1ccc(NS(C)(=O)=O)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.58
RAB9A P51151 3/20 0.58
SMN1; SMN2 Q16637 3/20 0.56
HPGD P15428 3/20 0.56
AR P10275 1/20 0.56
LMNA P02545 3/20 0.55
MAPK1 P28482 2/20 0.55
CA12 O43570 2/20 0.54
CA1 P00915 2/20 0.54
CA2 P00918 2/20 0.54
CA9 Q16790 2/20 0.54
CA7 P43166 1/20 0.54
PGR P06401 1/20 0.51
POLB P06746 2/20 0.50
MAPT P10636 1/20 0.50
NR3C1 P04150 1/20 0.49
KCNH2 Q12809 2/20 0.49
CACNA1F O60840 1/20 0.49
CHRM2 P08172 1/20 0.49
ACHE P22303 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3073466 0.81 NPC1 (0.63) NPC1RAB9ASMN1; SMN2HPGDAR
SCHEMBL12678490 0.79 LMNA (0.81) NPC1RAB9ASMN1; SMN2HPGDAR
SCHEMBL15427368 0.77 NPC1 (0.63) NPC1RAB9ASMN1; SMN2HPGDAR
SCHEMBL6086867 0.77 CA1 (0.50) NPC1RAB9ASMN1; SMN2ARLMNA
SCHEMBL717219 0.77 NPC1 (0.53) NPC1RAB9ASMN1; SMN2HPGDCA12
SCHEMBL12678489 0.76 NPC1 (0.61) NPC1RAB9ASMN1; SMN2HPGDAR
SCHEMBL14113144 0.76 NPC1 (0.93) NPC1RAB9ASMN1; SMN2HPGDAR
1,4-Diallyloxybenzene SCHEMBL302448 0.75 CA12 (0.63) NPC1RAB9ASMN1; SMN2LMNAMAPK1
SCHEMBL6575574 0.75 NPC1 (0.69) NPC1RAB9ASMN1; SMN2HPGDAR
SCHEMBL9732793 0.75 NPC1 (0.73) NPC1RAB9ASMN1; SMN2HPGDAR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-8101332-B2 Negative-working lithographic printing plate precursor and method of lithographic printing using same FUJIFILM CORPORATION (JP) 2012-01-24 US disclosed
EP-1972440-B1 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM CORP (JP) 2010-06-23 EP disclosed
EP-1136886-B1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORP (JP) 2010-05-19 EP disclosed
US-20090246688-A1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-2105298-A1 Negative-working lithographic printing plate precursor and method of lithographic printing using same Fujifilm Corporation (JP) 2009-09-30 EP disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 EP disclosed
US-6517987-B2 Mixture of 1,2-naphthoquinone-2-diazide-5-sulfonic acid and polymer FUJI PHOTO FILM CO., LTD. (JP) 2003-02-11 US disclosed
US-20010041299-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed
EP-1136886-A1 Positive-working presensitized plate useful for preparing a lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 2001-09-26 EP disclosed
EP-1077392-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2001-02-21 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0330239-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-22 EP disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
US-5104892-A N-heteroalkyl substitutes 1-aryloxy-2-propanolamine AMERICAN HOME PRODUCTS CORPORATION (US) 1992-04-14 US disclosed
WO-1991009023-A1 N-HETEROARALKYL-SUBSTITUTED 1-ARYLOXY-2-PROPANOLAMINE AND PROPYLAMINE DERIVATIVES POSSESSING CLASS III ANTIARRHYTHMIC ACTIVITY AMERICAN HOME PRODUCTS CORPORATION (US) 1991-06-27 WO disclosed
US-4994459-A Aryloxypropane substituted piperazine derivatives with antiarrhythmic and antifibrillatory activity AMERICAN HOME PRODUCTS CORPORATION (US) 1991-02-19 US disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 NPC1 4767/4885RAB9A 2814/4885SMN1; SMN2 815/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.