Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BACE1 | P56817 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | SCN4A | P35499 | 1/20 | 0.36 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.34 |
| ▸ | METAP2 | P50579 | 1/20 | 0.34 |
| ▸ | PDE2A | O00408 | 2/20 | 0.33 |
| ▸ | TGM2 | P21980 | 1/20 | 0.33 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.33 |
| ▸ | TAS2R14 | Q9NYV8 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | NPBWR1 | P48145 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.32 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16950904 | 0.84 | TAS2R14 (0.36) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL1473721 | 0.80 | TRPV1 (0.39) | KDM4EPKMTSHR | |
| SCHEMBL153259 | 0.80 | BACE1 (0.42) | BACE1KDM4EEPHX2SCN4ASIRT1 | |
| SCHEMBL25026056 | 0.78 | CYP1A1 (0.43) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL30233883 | 0.78 | CYP1A1 (0.43) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL13523746 | 0.78 | PDE2A (0.46) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL4076004 | 0.78 | CES2 (0.46) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL19145485 | 0.76 | ALDH1A1 (0.46) | BACE1KDM4EEPHX2SCN4APTPN5 | |
| SCHEMBL9996686 | 0.76 | PDE2A (0.49) | BACE1KDM4EEPHX2SCN4APDE2A | |
| SCHEMBL27832514 | 0.76 | KDM4E (0.39) | BACE1KDM4EEPHX2SCN4APDE2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 886 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250066567-A1 | RADIATIVE COOLING METAMATERIAL COMPOSITION AND METAMATERIAL FILM PREPARED FROM SAME | IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) (KR) | 2025-02-27 | — | — | US | claimed |
| WO-2023132572-A1 | RADIATIVE COOLING METAMATERIAL COMPOSITION AND METAMATERIAL FILM PREPARED FROM SAME | 한양대학교 산학협력단 | 2023-07-13 | — | — | WO | claimed |
| US-7504446-B2 | Aqueous inks containing colored polymers | XEROX CORPORATION (US) | 2009-03-17 | — | — | US | claimed |
| US-20060074142-A1 | Aqueous inks containing colored polymers | XEROX CORPORATION | 2006-04-06 | — | — | US | claimed |
| US-4423089-A | LATEX COPOLYMER CONSISTING OF DIOLEFIN, MONOVINYL MONOMER, AND POLYVINYL OR ACRYOYL MONOMER | FUJI PHOTO FILM CO., LTD. (JP) | 1983-12-27 | — | — | US | claimed |
| CN-120118458-A | Curable composition, resin, and cured product | 东京应化工业株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120044751-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| US-12312489-B2 | Curable composition, cured product and method for forming insulating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-119937242-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| US-20250066567-A1 | RADIATIVE COOLING METAMATERIAL COMPOSITION AND METAMATERIAL FILM PREPARED FROM SAME | IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) (KR) | 2025-02-27 | — | — | US | disclosed |
| CN-112394438-B | Method for manufacturing color filter, and resin composition | 东京应化工业株式会社 | 2025-01-03 | — | — | CN | disclosed |
| US-4065435-A | OXIDATION-REDUCTION PROPERTIES, ACRYLIC | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-27 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3963495-A | Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols | FUJI PHOTO FILM CO., LTD. (JA) | 1976-06-15 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |