SCHEMBL4004096

SCHEMBL4004096

O=C(CC(=O)OCC1CCCCC1)OCC1CCCCC1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.66
SLC1A3 P43003 3/20 0.42
SLC1A2 P43004 3/20 0.42
SLC1A1 P43005 3/20 0.42
EPHX1 P07099 4/20 0.41
KMT2A Q03164 3/20 0.41
HPGD P15428 2/20 0.41
MIF P14174 1/20 0.40
PARP15 Q460N3 1/20 0.40
PARP10 Q53GL7 1/20 0.40
NAAA Q02083 1/20 0.39
MGLL Q99685 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP3 P08254 1/20 0.38
MMP9 P14780 1/20 0.38
MMP8 P22894 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1734351 0.98 LMNA (0.62) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL1735477 0.93 LMNA (0.57) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL4962640 0.90 LMNA (0.56) LMNAKMT2AMEN1ATM
SCHEMBL7315668 0.90 LMNA (0.70) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL27436869 0.89 LMNA (0.54) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL13425332 0.88 LMNA (0.58) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL9208258 0.86 LMNA (0.85) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL20954311 0.85 LMNA (0.55) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL9852714 0.84 LMNA (0.63) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL27471005 0.84 LMNA (0.81) LMNASLC1A3SLC1A2SLC1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190285983-A1 RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2019-09-19 US disclosed
WO-2009074409-A1 S-TRIAZINE COMPOUNDS CONTAINING ONE AMINOSILOXANE GROUP AND TWO PARTICULAR PARA-AMINOBENZALMALONATE GROUPS; COSMETIC COMPOSITIONS CONTAINING SAID DERIVATIVES; USES OF SAID S-TRIAZINE DERIVATIVES L'OREAL (FR) 2009-06-18 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190285983-A1 RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN RER1, RFT1, RAD51 LMNA 3457/4885SLC1A3 2684/4885SLC1A2 1942/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.