Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.61 |
| ▸ | TYR | P14679 | 6/20 | 0.52 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4059100 | 1.00 | AMY1A (0.61) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL4055159 | 1.00 | AMY1A (0.61) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL30703618 | 1.00 | AMY1A (0.61) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL18174860 | 0.95 | AMY1A (0.66) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL14462755 | 0.93 | AMY1A (0.54) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL21096824 | 0.92 | AMY1A (0.57) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL22500133 | 0.91 | AMY1A (0.51) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL17340631 | 0.89 | AMY1A (0.50) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL4062078 | 0.87 | ALOX5 (0.49) | AMY1ATYRALOX5CYP2C9CYP2C19 | |
| SCHEMBL19621170 | 0.86 | AMY1A (0.75) | AMY1AALOX5CYP2C9CYP2C19SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0880892-B1 | Controlled release compositions | ROHM & HAAS (US) | 2002-12-18 | — | — | EP | claimed |
| US-6221374-B1 | BIOLOGICALLY ACTIVE COMPOUND, POLYPHENOLIC COMPOUND, ORGANIC SOLVENT CARRIER | ROHM AND HAAS COMPANY | 2001-04-24 | — | — | US | claimed |
| EP-0880892-A1 | Controlled release compositions | ROHM AND HAAS COMPANY (US) | 1998-12-02 | — | — | EP | claimed |
| JP-11012103-A | — | — | None | — | — | JP | disclosed |
| WO-2025041686-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| WO-2025041685-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING PLATED MOLDED ARTICLE, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | JSR株式会社 | 2025-02-27 | — | — | WO | disclosed |
| CN-117342932-A | Preparation method of 2,6-bis (2, 4-dihydroxybenzyl) -4-methylphenol | 沈阳化工研究院有限公司 | 2024-01-05 | — | — | CN | disclosed |
| US-20230333470-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-4063954-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-04 | — | — | EP | disclosed |
| WO-2023084961-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM | 日産化学株式会社 | 2023-05-19 | — | — | WO | disclosed |
| EP-3498788-B1 | SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS | AGFA GEVAERT NV (BE) | 2023-05-03 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| EP-0644460-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-03-22 | — | — | EP | disclosed |
| US-5340686-A | Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0477691-A2 | Positive-type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1992-04-01 | — | — | EP | disclosed |
| EP-0445680-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| US-4992356-A | Positive photoresists | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4992596-A | Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | disclosed |
| WO-1990007538-A1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-07-12 | — | — | WO | disclosed |