SCHEMBL4040098

SCHEMBL4040098

O=C1CCC(=O)N1OS(=O)(=O)C(F)(F)C(F)(F)C1CC2CCCCCCCCCCCC1CC2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PARL Q9H300 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL678037 0.88 PARL (0.34) PARL
SCHEMBL7049692 0.75 PARL (0.34) PARL
SCHEMBL4161247 0.74 PARL (0.34) PARL
SCHEMBL3916688 0.73 PARL (0.33) PARL
SCHEMBL16070060 0.71 KDM4E (0.39)
SCHEMBL7257185 0.71 ALDH1A1 (0.33)
SCHEMBL3435236 0.71
SCHEMBL29754082 0.68 KDM4E (0.44)
SCHEMBL3869288 0.65
SCHEMBL64814 0.64 PARL (0.50) PARL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2003148-A9 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2009-04-22 EP disclosed
EP-2003148-A2 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-12-17 EP disclosed