Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 1/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.46 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.45 |
| ▸ | MMP1 | P03956 | 2/20 | 0.44 |
| ▸ | MMP12 | P39900 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | FABP7 | O15540 | 1/20 | 0.43 |
| ▸ | FABP3 | P05413 | 1/20 | 0.43 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4061539 | 0.93 | ELANE (0.65) | ELANEKMT2AMEN1MAPTTDP1 | |
| SCHEMBL4058745 | 0.83 | NCEH1 (0.58) | ELANEKMT2AMEN1MAPTTDP1 | |
| SCHEMBL14564205 | 0.83 | ELANE (0.48) | ELANEKMT2AMEN1MAPTTDP1 | |
| SCHEMBL1809377 | 0.83 | KMT2A (0.66) | KMT2AMEN1MAPTTDP1CA2 | |
| SCHEMBL4061370 | 0.81 | ELANE (0.81) | ELANEKMT2AMEN1MAPTTDP1 | |
| SCHEMBL13845254 | 0.81 | ELANE (0.51) | ELANEKMT2AMEN1MAPTTDP1 | |
| SCHEMBL948124 | 0.81 | ALDH1A1 (0.49) | ELANEKMT2AMEN1CA2ALDH1A1 | |
| SCHEMBL14514195 | 0.80 | KMT2A (0.58) | KMT2AMEN1MAPTTDP1L3MBTL1 | |
| SCHEMBL18470649 | 0.80 | ELANE (0.50) | ELANEMAPTCA2L3MBTL1ALDH1A1 | |
| SCHEMBL17598755 | 0.80 | ELANE (0.58) | ELANEKMT2AMAPTCA2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160074853-A1 | LIGAND, NICKEL COMPLEX COMPRISING THE LIGAND, AND REACTION USING THE NICKEL COMPLEX | NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20090130419-A1 | FOAM SHEET AND PRODUCTION PROCESS THEREOF | OJI PAPER CO., LTD (JP) | 2009-05-21 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080070998-A1 | Foam Production Method | OJI PAPER CO., LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1795553-A1 | PROCESS FOR PRODUCING FOAM | Oji Paper Co., Ltd. (JP) | 2007-06-13 | — | — | EP | disclosed |
| US-20060210785-A1 | Foamed product in a sheet form and method for production thereof | OJI PAPER CO., LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1441256-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1647570-A1 | FOAMED PRODUCT IN A SHEET FORM AND METHOD FOR PRODUCTION THEREOF | Oji Paper Co., Ltd. (JP) | 2006-04-19 | — | — | EP | disclosed |
| EP-0789278-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-05-04 | — | — | EP | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| EP-0541112-B1 | Positive type light-senstitive composition | FUJI PHOTO FILM CO LTD (JP) | 2001-09-05 | — | — | EP | disclosed |
| EP-0249139-B2 | Resist compositions and use | MICROSI INC (US) | 1998-03-11 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0541112-A1 | Positive type light-senstitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-12 | — | — | EP | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160074853-A1 | LIGAND, NICKEL COMPLEX COMPRISING THE LIGAND, AND REACTION USING THE NICKEL COMPLEX | NISCH, DDT, TEC | ELANE 1846/4885KMT2A 2140/4885MEN1 1615/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | ELANE 422/4885KMT2A 1062/4885MEN1 754/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.