SCHEMBL4063876

SCHEMBL4063876

[CH2]C(Oc1ccccc1)C1CCC(=O)CC1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
CHRNB4 P30926 2/20 0.34
CHRNA3 P32297 2/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
ALDH1A1 P00352 1/20 0.34
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP13 P45452 1/20 0.33
SLC6A2 P23975 3/20 0.33
SLC6A4 P31645 3/20 0.33
SLC6A3 Q01959 3/20 0.33
CYP2C9 P11712 2/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2C19 P33261 1/20 0.32
KCNH2 Q12809 2/20 0.32
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL61120 0.80 IDO1 (0.44) CHRNB4CHRNA3ALDH1A1SLC6A2SLC6A4
SCHEMBL1044607 0.69 LMNA (0.46)
SCHEMBL146600 0.68 HRH1 (0.57) DDB1CRBNCHRNB4CHRNA3SLC6A2
SCHEMBL6404191 0.67 CA1 (0.44)
SCHEMBL18287876 0.66 HTR2A (0.47) CYP3A4
SCHEMBL7461857 0.66 DDB1 (0.38) DDB1CRBNMEN1KMT2AALDH1A1
SCHEMBL10449491 0.64 PKM (0.40) DDB1CRBNALDH1A1SLC6A2SLC6A4
SCHEMBL5525582 0.64 CARM1 (0.48)
SCHEMBL10611867 0.64 LTA4H (0.41) MEN1KMT2AALDH1A1SLC6A4CYP2C9
SCHEMBL420372 0.63 CYP2C9 (0.45) MEN1KMT2AALDH1A1SLC6A2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465010-B1 Positive resist composition FUJIFILM CORP (JP) 2009-10-21 EP disclosed
US-7232640-B1 Positive resist composition FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20070128547-A1 POSITIVE RESIST COMPOSITION FUJI PHOTO FILM CO., LTD. 2007-06-07 US disclosed
EP-1465010-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2004-10-06 EP disclosed