SCHEMBL4067401

SCHEMBL4067401

CCCCCCCC[N+]12CCN(CC1)CC2

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.36
THRB P10828 1/20 0.36
GNAI3 P08754 3/20 0.33
GNAO1 P09471 3/20 0.33
GNAI1 P63096 3/20 0.33
SLC10A2 Q12908 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3239761 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL4059880 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL841580 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL4062252 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL14380155 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL840549 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
SCHEMBL4058133 1.00 TSHR (0.36) TSHRTHRBGNAI3GNAO1GNAI1
Hydrochloric Acid SCHEMBL4258623 0.98 GNAI3 (0.36) TSHRTHRBGNAI3GNAO1GNAI1
Bromide SCHEMBL359338 0.98 TSHR (0.35) TSHRTHRBGNAI3GNAO1GNAI1
Hydrochloric Acid SCHEMBL3245280 0.98 GNAI3 (0.36) TSHRTHRBGNAI3GNAO1GNAI1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11859077-B2 Solvent-less ionic liquid epoxy resin ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (US) 2024-01-02 US disclosed
EP-3532463-B1 SOLVENT-LESS IONIC LIQUID EPOXY RESIN UNIV ARIZONA STATE (US) 2023-10-04 EP disclosed
US-8426102-B2 Lithographic printing plate precursor and plate making method FUJIFILM CORPORATION (JP) 2013-04-23 US disclosed
US-8309294-B2 2012-11-13 US disclosed
WO-2009040107-A2 METHOD FOR THE PRODUCTION OF METAL-CONTAINING NANOPARTICLES ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2009-04-02 WO disclosed
WO-2009024312-A2 METHOD FOR THE PRODUCTION AND STABILIZATION OF FUNCTIONAL METAL NANOPARTICLES IN IONIC LIQUIDS ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) 2009-02-26 WO disclosed
US-20080318155-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
EP-0478210-B1 Fluorinated diazabicycloalkane derivatives AIR PROD & CHEM (US) 1995-11-15 EP disclosed
EP-0478210-A1 Fluorinated diazabicycloalkane derivatives AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-04-01 EP disclosed
US-5086178-A Fluorinated diazabicycloalkane derivatives AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-02-04 US disclosed