SCHEMBL4076262

SCHEMBL4076262

Cc1ccc(S(=O)(=O)Oc2ccc(OS(=O)(=O)c3ccc(C)cc3)c(S(=O)(=O)Cl)c2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.52
MEN1 O00255 2/20 0.52
PTPN1 P18031 1/20 0.46
HTT P42858 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
ALDH1A1 P00352 2/20 0.46
MAPT P10636 1/20 0.46
HPGD P15428 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
CA12 O43570 2/20 0.44
CA2 P00918 2/20 0.44
GFER P55789 1/20 0.44
GAA P10253 2/20 0.43
ESR1 P03372 1/20 0.43
ESR2 Q92731 1/20 0.43
LMNA P02545 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ENPP3 O14638 3/20 0.43
ENPP1 P22413 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2064981 0.86 KMT2A (0.54) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL13924692 0.86 KMT2A (0.54) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL4077812 0.85 KMT2A (0.52) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL342714 0.85 KMT2A (0.56) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL2057491 0.84 KMT2A (0.57) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL5709635 0.84 KMT2A (0.51) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL4077813 0.84 KMT2A (0.55) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL4084466 0.80 MEN1 (0.53) KMT2AMEN1HTTALDH1A1MAPT
SCHEMBL28923304 0.80 MEN1 (0.48) KMT2AMEN1PTPN1HTTL3MBTL1
SCHEMBL4074430 0.80 MEN1 (0.65) KMT2AMEN1HTTL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH KMT2A 890/4885MEN1 4466/4885PTPN1 554/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.