SCHEMBL4084466

SCHEMBL4084466

Cc1ccc(S(=O)(=O)Oc2ccc(S(=O)(=O)Cl)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
ENPP3 O14638 3/20 0.52
ENPP1 P22413 3/20 0.52
ENPP2 Q13822 3/20 0.52
CA2 P00918 4/20 0.50
CA12 O43570 2/20 0.50
ALDH1A1 P00352 2/20 0.50
MAPT P10636 1/20 0.50
HTT P42858 1/20 0.50
CA1 P00915 1/20 0.50
CA9 Q16790 1/20 0.50
PPARG P37231 1/20 0.50
TDP1 Q9NUW8 1/20 0.49
LMNA P02545 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
KEAP1 Q14145 1/20 0.47
NFE2L2 Q16236 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9852204 0.90 MEN1 (0.60) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL4126086 0.90 MEN1 (0.60) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL18179825 0.90 MEN1 (0.60) MEN1KMT2AENPP3ENPP1ENPP2
Iodide SCHEMBL22068772 0.88 CA2 (0.59) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL9870770 0.85 TDP1 (0.68) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL12584886 0.85 TDP1 (0.68) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL4074430 0.85 MEN1 (0.65) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL941647 0.85 GAA (0.64) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL6937173 0.85 CA2 (0.64) MEN1KMT2AENPP3ENPP1ENPP2
SCHEMBL8069392 0.83 MEN1 (0.54) MEN1KMT2AENPP3ENPP1ENPP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20090017112-A1 Compounds for Inhibiting Beta-Amyloid Production ROSKAMP RESEARCH LLC (US) 2009-01-15 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090017112-A1 Compounds for Inhibiting Beta-Amyloid Production PSEN1, PSEN2, APP MEN1 3748/4885KMT2A 4404/4885ENPP3 1368/4885
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH MEN1 4466/4885KMT2A 890/4885ENPP3 3037/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.