SCHEMBL4074430

SCHEMBL4074430

Cc1ccc(S(=O)(=O)Oc2ccc3cc(S(=O)(=O)Cl)ccc3c2)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.65
KMT2A Q03164 1/20 0.65
L3MBTL1 Q9Y468 3/20 0.55
TDP1 Q9NUW8 2/20 0.55
HTT P42858 2/20 0.55
LMNA P02545 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
GAA P10253 1/20 0.51
MAPK1 P28482 1/20 0.51
CA2 P00918 3/20 0.48
CA12 O43570 2/20 0.48
ENPP2 Q13822 2/20 0.47
ALDH1A1 P00352 2/20 0.47
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
NPSR1 Q6W5P4 1/20 0.47
ENPP3 O14638 1/20 0.44
ENPP1 P22413 1/20 0.44
CYP1A2 P05177 1/20 0.43
MAOB P27338 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8794066 0.87 MEN1 (0.82) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL13924688 0.86 MEN1 (0.67) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL11689531 0.86 TDP1 (0.60) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL2066126 0.86 MEN1 (0.67) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL4084466 0.85 MEN1 (0.53) MEN1KMT2ATDP1HTTLMNA
SCHEMBL4075923 0.84 MEN1 (0.65) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL482271 0.84 MEN1 (0.69) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL29870275 0.84 L3MBTL1 (0.77) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL6882887 0.84 L3MBTL1 (0.77) MEN1KMT2AL3MBTL1TDP1HTT
SCHEMBL26326698 0.84 L3MBTL1 (0.71) MEN1KMT2AL3MBTL1TDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH MEN1 4466/4885KMT2A 890/4885L3MBTL1 3023/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.