Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.42 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | ADRA2B | P18089 | 6/20 | 0.36 |
| ▸ | ADRA2C | P18825 | 6/20 | 0.36 |
| ▸ | ADRA2A | P08913 | 5/20 | 0.36 |
| ▸ | HTR1A | P08908 | 3/20 | 0.36 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3772407 | 0.84 | GABRA1 (0.40) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL12848969 | 0.79 | GABRA1 (0.42) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL10389350 | 0.78 | GABRA1 (0.41) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL173300 | 0.77 | GABRA1 (0.56) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL29763626 | 0.77 | GABRA1 (0.56) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| Phosphine SCHEMBL28908229 | 0.74 | GABRA1 (0.54) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL10528834 | 0.74 | GABRA1 (0.54) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL11765775 | 0.74 | GABRA1 (0.54) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL19437729 | 0.74 | GABRA1 (0.54) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C | |
| SCHEMBL723201 | 0.73 | GABRA1 (0.38) | GABRA1GABRB2ALDH1A1ADRA2BADRA2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12109812-B2 | Ink jet printing method and ink jet printing apparatus | SEIKO EPSON CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| CN-114055975-B | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-114055975-A | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-20220032618-A1 | Ink Jet Printing Method And Ink Jet Printing Apparatus | SEIKO EPSON CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-9579852-B2 | Method for manufacturing three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160339602-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-20160263829-A1 | THREE-DIMENSIONAL MODELING APPARATUS, MANUFACTURING METHOD, AND COMPUTER PROGRAM | SEIKO EPSON CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-9415545-B2 | Method of manufacturing three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| WO-2016067584-A1 | METHOD FOR MANUFACTURING THREE-DIMENSIONAL STRUCTURE, THREE-DIMENSIONAL STRUCTURE MANUFACTURING APPARATUS, AND THREE-DIMENSIONAL STRUCTURE | SEIKO EPSON CORPORATION (JP) | 2016-05-06 | — | — | WO | disclosed |
| US-20150231798-A1 | APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, METHOD OF MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-08-20 | — | — | US | disclosed |
| US-20150210016-A1 | METHOD FOR MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT AND THREE-DIMENSIONAL SHAPED OBJECT | SEIKO EPSON CORPORATION (JP) | 2015-07-30 | — | — | US | disclosed |
| US-20150140295-A1 | METHOD OF MANUFACTURING THREE-DIMENSIONAL SHAPED OBJECT, THREE-DIMENSIONAL SHAPED OBJECT, THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS, METHOD OF CONTROLLING THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS, AND PROGRAM FOR CONTROLLING THREE-DIMENSIONAL SHAPED OBJECT MANUFACTURING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2015-05-21 | — | — | US | disclosed |
| US-8322033-B2 | Method for forming a conductive post for a multilayered wiring substrate | SEIKO EPSON CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| US-6022987-A | Aryl substituted alkylsilanes and a preparation method thereof | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2000-02-08 | — | — | US | disclosed |