⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4077124 | 0.81 | ADRB2 (0.41) | — | |
| SCHEMBL28496567 | 0.75 | — | — | |
| SCHEMBL699216 | 0.72 | — | — | |
| SCHEMBL23873 | 0.72 | CA1 (0.30) | — | |
| SCHEMBL2114336 | 0.72 | CA1 (0.30) | — | |
| SCHEMBL25242791 | 0.69 | — | — | |
| SCHEMBL378372 | 0.69 | — | — | |
| SCHEMBL106001 | 0.69 | — | — | |
| SCHEMBL106329 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL28809989 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| US-11059994-B2 | Silicone resin, related methods, and film formed therewith | DOW SILICONES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| US-20200248031-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION | 2020-08-06 | — | — | US | disclosed |
| WO-2019027908-A1 | SILICONE RESIN, RELATED METHODS, AND FILM FORMED THEREWITH | DOW SILICONES CORPORATION (US) | 2019-02-07 | — | — | WO | disclosed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | disclosed |
| US-20070173072-A1 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1717848-A1 | METHOD FOR PRODUCING SILICON OXIDE FILM | TOAGOSEI CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |