SCHEMBL699216

SCHEMBL699216

CCO[Si]([SiH3])(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trimethylammonium SCHEMBL27513041 0.90
SCHEMBL6676094 0.83
SCHEMBL28080993 0.81
Biphenyl SCHEMBL27846300 0.77 ALDH1A1 (0.41)
SCHEMBL1639742 0.74
SCHEMBL7594077 0.74
SCHEMBL4079951 0.72
SCHEMBL5691043 0.72
SCHEMBL452809 0.67
SCHEMBL17680 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116867855-A Sol-gel coating for imparting barrier properties to coated substrates and method of use thereof 马努埃尔·米利耶里 2023-10-10 CN claimed
US-8026035-B2 Organosilicon polymer containing chromogen; antireflactivity coating for lithography CHEIL INDUSTRIES, INC. (KR) 2011-09-27 US claimed
US-7488693-B2 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2009-02-10 US claimed
US-20080241748-A1 Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same CHEIL INDUSTRIES, INC. (KR) 2008-10-02 US claimed
EP-0625532-B1 Precursor for ceramic coatings DOW CORNING (US) 1997-11-05 EP claimed
CN-119923247-A Compositions with improved SPF and UVA photoprotection 西姆莱斯股份公司 2025-05-02 CN disclosed
CN-119584951-A Composition comprising a UV filter stabilizer 西姆莱斯股份公司 2025-03-07 CN disclosed
CN-119092909-A Outer packaging material for power storage device 凸版印刷株式会社 2024-12-06 CN disclosed
CN-119032137-A Thermally conductive filler 株式会社德山 2024-11-26 CN disclosed
US-20240213017-A1 METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-06-27 US disclosed
CN-117413012-A Silane coupling agent composition and rubber composition containing same 引能仕株式会社 2024-01-16 CN disclosed
CN-116917380-A Organopolysiloxane and cosmetic containing the same 信越化学工业株式会社 2023-10-20 CN disclosed
EP-1173505-B1 SILICONE COMPOSITION USED IN THE PRODUCTION OF ANTIFRICTION VARNISHES, METHOD FOR THE APPLICATION OF SAID VARNISHES TO A SUPPORT AND SUPPORT THUS TREATED RHODIA CHIMIE SA (FR) 2007-10-17 EP disclosed
US-20070173072-A1 Method for producing silicon oxide film TOAGOSEI CO., LTD. (JP) 2007-07-26 US disclosed
EP-1717848-A1 METHOD FOR PRODUCING SILICON OXIDE FILM TOAGOSEI CO., LTD. (JP) 2006-11-02 EP disclosed
US-6902816-B1 Silicone composition used in the production of antifriction varnishes, method for the application of said varnishes to a support and support thus treated RHODIA CHIMIE (FR) 2005-06-07 US disclosed
US-20050037210-A1 Silicone composition used in the production of antifriction varnishes, method for the application of said varnishes to a support and support thus treated BERTRY JEAN-LOUIS (FR) 2005-02-17 US disclosed
EP-1173505-A1 SILICONE COMPOSITION USED IN THE PRODUCTION OF ANTIFRICTION VARNISHES, METHOD FOR THE APPLICATION OF SAID VARNISHES TO A SUPPORT AND SUPPORT THUS TREATED Rhodia Chimie (FR) 2002-01-23 EP disclosed
WO-2000059992-A1 SILICONE COMPOSITION USED IN THE PRODUCTION OF ANTIFRICTION VARNISHES, METHOD FOR THE APPLICATION OF SAID VARNISHES TO A SUPPORT AND SUPPORT THUS TREATED RHODIA CHIMIE (FR) 2000-10-12 WO disclosed
US-5096877-A Polyester film adhered to one surface of paper; dye receiving layer cured on film; wrinkle resistance MITSUBISHI RAYON CO., LTD. (JP) 1992-03-17 US disclosed