SCHEMBL4081565

SCHEMBL4081565

Cc1ccc(S(=O)(=O)Oc2cccc3cccc(S(=O)(=O)Cl)c23)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.50
MEN1 O00255 5/20 0.50
GAA P10253 2/20 0.50
ESR1 P03372 1/20 0.50
ESR2 Q92731 1/20 0.50
ALDH1A1 P00352 3/20 0.48
LMNA P02545 2/20 0.48
MAPK1 P28482 1/20 0.48
KDM4E B2RXH2 1/20 0.48
HPGD P15428 1/20 0.48
MAPT P10636 3/20 0.43
HTR6 P50406 1/20 0.43
CYP1A2 P05177 1/20 0.42
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
HTT P42858 1/20 0.41
GFER P55789 1/20 0.39
HSD11B1 P28845 1/20 0.39
HSD17B3 P37058 1/20 0.39
METAP2 P50579 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2066180 0.87 MEN1 (0.51) KMT2AMEN1GAAESR1ESR2
SCHEMBL4079121 0.86 MEN1 (0.53) KMT2AMEN1GAAESR1ESR2
SCHEMBL482422 0.86 KMT2A (0.53) KMT2AMEN1GAAESR1ESR2
SCHEMBL4079124 0.85 KMT2A (0.52) KMT2AMEN1GAAESR1ESR2
SCHEMBL6743646 0.84 MEN1 (0.48) KMT2AMEN1GAAESR1ESR2
SCHEMBL3964599 0.82 KMT2A (0.66) KMT2AMEN1GAAESR1ESR2
SCHEMBL6743103 0.81 LMNA (0.46) KMT2AMEN1GAAESR1ESR2
SCHEMBL6745151 0.81 LMNA (0.46) KMT2AMEN1GAAESR1ESR2
SCHEMBL6743643 0.81 KMT2A (0.48) KMT2AMEN1GAAESR1ESR2
SCHEMBL28072677 0.80 KMT2A (0.68) KMT2AMEN1GAAESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH KMT2A 890/4885MEN1 4466/4885GAA 1315/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.