Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 8/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.34 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.34 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.34 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.34 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.34 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.34 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL270387 | 0.81 | NPSR1 (0.43) | EPHX2MEN1KMT2ANPSR1GRIN2D | |
| SCHEMBL2084363 | 0.81 | EPHX2 (0.43) | EPHX2MEN1KMT2ANPSR1ALDH1A1 | |
| SCHEMBL15533591 | 0.79 | EPHX2 (0.45) | EPHX2MEN1KMT2ANPSR1ALDH1A1 | |
| SCHEMBL25753188 | 0.79 | EPHX2 (0.45) | EPHX2MEN1KMT2ANPSR1ALDH1A1 | |
| SCHEMBL4082782 | 0.78 | NPSR1 (0.33) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL17571012 | 0.78 | NPSR1 (0.34) | MEN1KMT2ANPSR1ALDH1A1HTT | |
| SCHEMBL10069432 | 0.77 | NPSR1 (0.40) | EPHX2MEN1KMT2ANPSR1GRIN2D | |
| SCHEMBL4807262 | 0.75 | NPSR1 (0.31) | MEN1KMT2ANPSR1ALDH1A1HTT | |
| SCHEMBL482480 | 0.75 | ALDH1A1 (0.41) | EPHX2MEN1KMT2ANPSR1ALDH1A1 | |
| SCHEMBL2739892 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8114949-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8071270-B2 | Polyhydric compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-06 | — | — | US | disclosed |
| US-8071270-B2 | Polyhydric compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-06 | — | — | US | disclosed |
| US-20090226851-A1 | (METH)ACRYLATE, POLYMER AND RESIST COMPOSITION | MITSUBISHI RAYON CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7485413-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7476488-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-01-13 | — | — | US | disclosed |
| US-7338755-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070224550-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224549-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
| US-20060003254-A1 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-01-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, H1-4 | EPHX2 3789/4885MEN1 366/4885KMT2A 796/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.