Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL386960 | 0.81 | NPSR1 (0.38) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL218805 | 0.81 | ALDH1A1 (0.35) | NPSR1 | |
| SCHEMBL4082783 | 0.78 | EPHX2 (0.40) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL17159507 | 0.78 | ALDH1A1 (0.33) | NPSR1 | |
| SCHEMBL4807262 | 0.75 | NPSR1 (0.31) | NPSR1 | |
| SCHEMBL17571012 | 0.74 | NPSR1 (0.34) | NPSR1 | |
| SCHEMBL482478 | 0.73 | ALDH1A1 (0.37) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL10069432 | 0.73 | NPSR1 (0.40) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL4808709 | 0.72 | NPSR1 (0.32) | NPSR1 | |
| SCHEMBL860908 | 0.72 | NPSR1 (0.38) | NPSR1GRIN2DGRIN3BGRIN1GRIN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485413-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7476488-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-01-13 | — | — | US | disclosed |
| US-7338755-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070224550-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224549-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
| US-20060003254-A1 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-01-05 | — | — | US | disclosed |