SCHEMBL4082976

SCHEMBL4082976

CC(C)O[Si](CBr)(OC(C)C)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
ALDH1A1 P00352 2/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
LMNA P02545 1/20 0.31
TRPA1 O75762 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704437 0.83 TSHR (0.33) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL703426 0.83 TSHR (0.33) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL706392 0.82 TSHR (0.32) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL707187 0.80 TSHR (0.32) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL4077495 0.80 LMNA (0.34) TSHRALDH1A1L3MBTL1LMNATRPA1
SCHEMBL27730630 0.80 TSHR (0.35) TSHRALDH1A1L3MBTL1LMNATRPA1
SCHEMBL703879 0.80 TSHR (0.32) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL4079957 0.80 TSHR (0.32) TSHRALDH1A1L3MBTL1LMNATRPA1
SCHEMBL4078011 0.80 TSHR (0.32) TSHRALDH1A1L3MBTL1LMNA
SCHEMBL27618717 0.80 TAAR1 (0.38) TSHRALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed