SCHEMBL4083636

SCHEMBL4083636

CC(C)(C)C(O[SiH3])C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4768827 0.81
SCHEMBL9526114 0.81
SCHEMBL1314577 0.71
SCHEMBL4770339 0.67 TSHR (0.32)
SCHEMBL9750777 0.67
SCHEMBL108750 0.67
SCHEMBL13837377 0.65
SCHEMBL10625852 0.65
SCHEMBL11911972 0.64 ALDH1A1 (0.33)
SCHEMBL13653077 0.61 TSHR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030064154-A1 Low-K dielectric thin films and chemical vapor deposition method of making same ADVANCED TECHNOLOGY MATERIALS, INC. 2003-04-03 US claimed
WO-2003015129-A2 LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME ADVANCED TECHNOLOGY MATERIAL, INC. (US) 2003-02-20 WO claimed
JP-6228224-A None JP disclosed
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US disclosed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN disclosed
CN-109641482-B Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues 株式会社普利司通 2021-11-05 CN disclosed
WO-2020209202-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM 東ソー株式会社 2020-10-15 WO disclosed
EP-1875961-B1 CAPSULAR FINE PARTICLE COMPRISING OLEFINIC POLYMER MITSUI CHEMICALS INC (JP) 2018-08-29 EP disclosed
US-8349451-B2 Capsular fine particle comprising olefinic polymer MITSUI CHEMICALS, INC. (JP) 2013-01-08 US disclosed
US-20090098381-A1 Capsular Fine Particle Comprising Olefinic Polymer MITSUI CHEMICALS, INC. (JP) 2009-04-16 US disclosed
EP-1832351-B1 Low dielectric materials and methods for making same AIR PROD & CHEM (US) 2008-11-12 EP disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed
US-20030064154-A1 Low-K dielectric thin films and chemical vapor deposition method of making same ADVANCED TECHNOLOGY MATERIALS, INC. 2003-04-03 US disclosed
WO-2003015129-A2 LOW-K DIELECTRIC THIN FILMS AND CHEMICAL VAPOR DEPOSITION METHOD OF MAKING SAME ADVANCED TECHNOLOGY MATERIAL, INC. (US) 2003-02-20 WO disclosed
EP-0713153-B1 Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner CANON KK (JP) 2001-03-14 EP disclosed
US-6034025-A Catalyst for polymerization and copolymerization of olefins SAMSUNG GENERAL CHEMICALS, CO., LTD. (KR) 2000-03-07 US disclosed
US-5824442-A CONTROLLING DEVELOPMENT AND DEVELOPMENT FOR ELECTROSTATIC IMAGES WITH THIN FILMS CANON KABUSHIKI KAISHA (JP) 1998-10-20 US disclosed
US-5707770-A TITANIA OR ALUMINA PARTICLES SURFACE TREATED WITH A SILICON COMPOUND OR SILICONE OIL, IMPROVED PERFORMANCE IN HIGH HUMIDITY CANON KABUSHIKI KAISHA (JP) 1998-01-13 US disclosed
EP-0713153-A2 Toner for developing electrostatic images, two component type developer, developing method, image forming method, heat fixing method, and process for producing toner CANON KABUSHIKI KAISHA (JP) 1996-05-22 EP disclosed
JP-H06228224-A ELECTRON DONOR COMBINED WITH ZIEGLER-NATTA CATALYST FOR POLYDISPERSITY CONTROL OF POLYOLEFIN FINA TECHNOL INC 1994-08-16 JP disclosed