SCHEMBL4084761

SCHEMBL4084761

CCCO[Si](CCl)(CCc1ccccc1)CCc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.37
NPC1 O15118 3/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
MAPT P10636 2/20 0.37
NFKB1 P19838 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 2/20 0.34
ALDH1A1 P00352 1/20 0.34
POLB P06746 1/20 0.34
HPGD P15428 1/20 0.34
ALOX12 P18054 1/20 0.34
HTT P42858 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
IDO1 P14902 1/20 0.34
SIGMAR1 Q99720 3/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4077832 0.86 TDP1 (0.38) RAB9ANPC1SMN1; SMN2MAPTTDP1
SCHEMBL4081596 0.83 RAB9A (0.37) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL4077436 0.83 TDP1 (0.39) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL4079216 0.83 HPGD (0.41) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL4077203 0.79 TDP1 (0.40) RAB9ANPC1SMN1; SMN2TDP1ALDH1A1
SCHEMBL106648 0.79 RAB9A (0.40) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL20658023 0.79 RAB9A (0.40) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL4077993 0.75 NPC1 (0.38) RAB9ANPC1SMN1; SMN2NFKB1TDP1
SCHEMBL6332013 0.75 RAB9A (0.38) RAB9ANPC1SMN1; SMN2MAPTNFKB1
SCHEMBL28065352 0.75 RAB9A (0.38) RAB9ANPC1SMN1; SMN2MAPTNFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed