SCHEMBL4085244

SCHEMBL4085244

C=CC(=O)N(C)c1cccc2ccccc12

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 11/20 0.59
BTK Q06187 3/20 0.42
ALDH1A1 P00352 1/20 0.42
KMT2A Q03164 1/20 0.42
TUBB4A P04350 1/20 0.41
TUBB P07437 1/20 0.41
TUBA3C P0DPH7 1/20 0.41
STAT3 P40763 1/20 0.41
TUBA1B P68363 1/20 0.41
TUBA4A P68366 1/20 0.41
TUBB4B P68371 1/20 0.41
TUBB3 Q13509 1/20 0.41
TUBB2A Q13885 1/20 0.41
TUBB8 Q3ZCM7 1/20 0.41
TUBA3E Q6PEY2 1/20 0.41
TUBA1A Q71U36 1/20 0.41
TUBA1C Q9BQE3 1/20 0.41
TUBB6 Q9BUF5 1/20 0.41
TUBB2B Q9BVA1 1/20 0.41
TUBB1 Q9H4B7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27816542 0.83 SIGMAR1 (0.42) SIGMAR1BTKALDH1A1CNR2
SCHEMBL8150820 0.81 SIGMAR1 (0.65) SIGMAR1KMT2A
SCHEMBL29666490 0.79 SIGMAR1 (0.67) SIGMAR1CNR2
SCHEMBL27966636 0.79 BTK (0.40) BTKALDH1A1KMT2A
SCHEMBL1614544 0.79 SIGMAR1 (0.67) SIGMAR1CNR2
SCHEMBL3626830 0.79 SIGMAR1 (0.67) SIGMAR1ALDH1A1
SCHEMBL2799227 0.78 SIGMAR1 (0.54) SIGMAR1ALDH1A1KMT2ATUBB4ATUBB
SCHEMBL1839015 0.77 SIGMAR1 (0.65) SIGMAR1
SCHEMBL10943508 0.77 SIGMAR1 (0.65) SIGMAR1CNR2
SCHEMBL11872011 0.77 SIGMAR1 (0.65) SIGMAR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104650286-A Preparation method for polymethyl methacrylate resin with high heat resistance UNIV CHANGCHUN TECHNOLOGY 2015-05-27 CN claimed
CN-105082725-B Original edition of lithographic printing plate 富士胶片株式会社 2018-05-04 CN disclosed
CN-107615062-A Hydrogel particles with tunable optical properties and methods of using the same 弹弓生物科学公司 2018-01-19 CN disclosed
CN-104650286-B The preparation method of high heat-resistant polymethyl methacrylate resin 长春工业大学 2017-12-05 CN disclosed
CN-104011567-B Optical component set and solid-state imaging element using the same 富士胶片株式会社 2016-06-22 CN disclosed
CN-103832050-B Original edition of lithographic printing plate and use its image forming method Eastman Kodak Company (US) 343 State Street, Rochester, New York (US) 2016-04-06 CN disclosed
CN-102385245-B The preparation method of Image forming material, original edition of lithographic printing plate and lithographic plate FUJI FILM CORP. (JP) 2015-12-09 CN disclosed
CN-105082725-A Lithographic printing original plate FUJIFILM CORP 2015-11-25 CN disclosed
CN-103959104-B Optical component group and use the solid-state imager of this optical component group FUJIFILM CORP. (JP) 2015-11-25 CN disclosed
CN-102548769-B Lithographic printing plate precursor FUJIFILM CORP. (JP) 2015-08-12 CN disclosed
CN-1790772-A Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORP (JP) 2006-06-21 CN disclosed
US-20060127563-A1 Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORPORATION (JP) 2006-06-15 US disclosed
US-20050287392-A1 Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2005-12-29 US disclosed
CN-1713787-A Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORP (JP) 2005-12-28 CN disclosed
CN-1604849-A Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS CO (US) 2005-04-06 CN disclosed
EP-0944581-A4 PROCESS OF PREPARING SUBSTITUTED ACRYLAMIDES LILLY CO ELI (US) 2004-09-08 EP disclosed
CN-1495524-A Polymeric composition and lithographic printing platemaking forebody 富士胶片株式会社 2004-05-12 CN disclosed
CN-1406747-A Image recording material FUJI PHOTO FILM CO LTD (JP) 2003-04-02 CN disclosed
EP-0944581-A1 PROCESS OF PREPARING SUBSTITUTED ACRYLAMIDES ELI LILLY AND COMPANY (US) 1999-09-29 EP disclosed
WO-1998022429-A1 PROCESS OF PREPARING SUBSTITUTED ACRYLAMIDES ELI LILLY AND COMPANY (US) 1998-05-28 WO disclosed