SCHEMBL4098559

SCHEMBL4098559

C=C(CCC12CC3CC(CC(C#N)(C3)C1)C2)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.35
HSD11B1 P28845 1/20 0.33
GAA P10253 1/20 0.33
DPP4 P27487 2/20 0.32
ALDH1A1 P00352 5/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5935895 0.87
SCHEMBL4092131 0.82
SCHEMBL4092588 0.80 GRIN2D (0.39) DPP4MEN1KMT2A
SCHEMBL4085663 0.79 GAA (0.39) POLBGAAALDH1A1MEN1KMT2A
SCHEMBL2409512 0.79 MAPT (0.42) POLBHSD11B1GAADPP4ALDH1A1
SCHEMBL2409327 0.78 EPHX2 (0.44) ALDH1A1MEN1KMT2A
SCHEMBL5935978 0.78 ALDH1A1 (0.52) POLBHSD11B1GAAALDH1A1MEN1
SCHEMBL4102901 0.76 GAA (0.41) POLBHSD11B1GAADPP4ALDH1A1
SCHEMBL27619158 0.73 GRIN2D (0.35) GAA
SCHEMBL4090164 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-9348226-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2016-05-24 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8697343-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2014-04-15 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed
US-20060234154-A1 Mixture containing acid generator and free radical catalyst; acrylated ester monomer JSR CORPORATION (JP) 2006-10-19 US disclosed