Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 4/20 | 0.44 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.43 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.43 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.43 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.43 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.43 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.43 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.41 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.41 |
| ▸ | CCR6 | P51684 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2409512 | 0.83 | MAPT (0.42) | MEN1KMT2AALDH1A1MAPT | |
| SCHEMBL4085663 | 0.83 | GAA (0.39) | EPHX2MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL704030 | 0.82 | ALDH1A1 (0.50) | EPHX2MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL5935978 | 0.81 | ALDH1A1 (0.52) | MEN1KMT2AALDH1A1L3MBTL1 | |
| SCHEMBL1323193 | 0.81 | EPHX2 (0.48) | EPHX2GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL6858927 | 0.81 | EPHX2 (0.48) | EPHX2GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL7337692 | 0.79 | EPHX2 (0.50) | EPHX2GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL4098628 | 0.78 | GAA (0.31) | MEN1KMT2AALDH1A1 | |
| SCHEMBL8779463 | 0.78 | EPHX2 (0.40) | EPHX2GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL4098559 | 0.78 | POLB (0.35) | MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9788420-B2 | Substrate and touch panel member using same | TORAY INDUSTRIES, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9690197-B2 | Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method | TORAY INDUSTRIES, INC. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9510444-B2 | — | — | 2016-11-29 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9482950-B2 | Curable composition for imprints, pattern-forming method and pattern | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-20160161847-A1 | NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD | TORAY INDUSTRIES, INC. (JP) | 2016-06-09 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20150366055-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150125680-A1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES, INC. (JP) | 2015-05-07 | — | — | US | disclosed |
| US-20120171612-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER | JSR CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-20050095527-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |