SCHEMBL4103284

SCHEMBL4103284

C=CC(=O)Nc1cccc(NC(=O)C=C)c1

nearest known ligand 0.76

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 8/20 0.76
LPAR1 Q92633 1/20 0.60
LPAR2 Q9HBW0 1/20 0.60
EGFR P00533 4/20 0.57
F13A1 P00488 1/20 0.57
LMNA P02545 1/20 0.57
TGM1 P22735 1/20 0.57
TGM3 Q08188 1/20 0.57
JAK3 P52333 1/20 0.54
MAP2K7 O14733 1/20 0.54
AURKA O14965 1/20 0.54
BTK Q06187 3/20 0.52
ITK Q08881 3/20 0.52
GPR35 Q9HC97 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22600367 0.91 TGM2 (0.65) TGM2LPAR1LPAR2EGFRF13A1
SCHEMBL6355891 0.91 TGM2 (0.65) TGM2LPAR1LPAR2EGFR
SCHEMBL19501282 0.89 TGM2 (0.76) TGM2LPAR1LPAR2EGFRLMNA
SCHEMBL17397388 0.88 TGM2 (0.67) TGM2LPAR1LPAR2EGFRF13A1
SCHEMBL1119155 0.88 TGM2 (0.67) TGM2F13A1LMNATGM1TGM3
SCHEMBL29380510 0.88 TGM2 (0.67) TGM2F13A1LMNATGM1TGM3
SCHEMBL1381249 0.87 TGM2 (1.00) TGM2EGFRF13A1LMNATGM1
SCHEMBL2318657 0.87 TGM2 (0.65) TGM2LPAR1LPAR2EGFRF13A1
SCHEMBL8472105 0.87 TGM2 (0.65) TGM2EGFRLMNABTK
SCHEMBL1380349 0.87 TGM2 (0.65) TGM2BTK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116410403-A High-temperature-resistant tackifying and cutting agent as well as preparation and application thereof 中国石油天然气集团有限公司 2023-07-11 CN claimed
CN-113880993-B Hydrophobically modified polymer microsphere and preparation method and application thereof 中国石油化工股份有限公司 2023-07-04 CN claimed
US-10772822-B2 Molecularly imprinted polymers and their use as antidandruff agents L'OREAL (FR) 2020-09-15 US claimed
EP-2938641-B1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS ORÉAL L (FR) 2016-08-24 EP claimed
US-20150342859-A1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS L'OREAL (FR) 2015-12-03 US claimed
US-20150320667-A1 MOLECULARLY IMPRINTED POLYMER FOR SELECTIVELY TRAPPING ODOROUS MOLECULES L'OREAL (FR) 2015-11-12 US claimed
US-20030144399-A1 Polymeric stabilizer for pigment dispersions COGNIS CORPORATION 2003-07-31 US claimed
WO-2003037984-A1 POLYMERIC STABILIZER FOR PIGMENT DISPERSIONS COGNIS CORPORATION (US) 2003-05-08 WO claimed
CN-116410403-A High-temperature-resistant tackifying and cutting agent as well as preparation and application thereof 中国石油天然气集团有限公司 2023-07-11 CN disclosed
CN-116410403-A High-temperature-resistant tackifying and cutting agent as well as preparation and application thereof 中国石油天然气集团有限公司 2023-07-11 CN disclosed
CN-108699377-B Water-based primer coating containing gloss pigment, and multilayer coating film forming method using same 关西涂料株式会社 2021-08-24 CN disclosed
US-20210129184-A1 BRILLIANT PIGMENT-CONTAINING AQUEOUS BASE COAT COATING MATERIAL, AND METHOD FOR FORMING MULTILAYER FILM USING SAME KANSAI PAINT CO., LTD. (JP) 2021-05-06 US disclosed
US-10772823-B2 Molecularly imprinted polymer for selectively trapping odorous molecules L'OREAL (FR) 2020-09-15 US disclosed
US-10772822-B2 Molecularly imprinted polymers and their use as antidandruff agents L'OREAL (FR) 2020-09-15 US disclosed
US-4297945-A HEAT-RESISTANT PRINTING PLATES OF CROSSLINKED PHOTOSENSITIVE UNSATURATED CONDENSATION POLYMER SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1981-11-03 US disclosed
EP-0020782-A1 LIGHT-SENSITIVE POLYAMIDE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 1981-01-07 EP disclosed
US-4170481-A SOLUBLE POLYMER AND PHOTOPOLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUND TORAY INDUSTRIES, INC. (JP) 1979-10-09 US disclosed
US-4156389-A Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1979-05-29 US disclosed
US-4144156-A Manufacture of unsymmetric monoacetals of aromatic 1,2-diketones employable as photoiniatiators BASF AKTIENGESELLSCHAFT (DE) 1979-03-13 US disclosed
US-3998712-A ULTRAVIOLET RADIATION; LONG SHELF LIFE BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-12-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10772822-B2 Molecularly imprinted polymers and their use as antidandruff agents DNMT1, POLR1C, ETF1 TGM2 3785/4885LPAR1 1706/4885LPAR2 1747/4885
US-20150342859-A1 MOLECULARLY IMPRINTED POLYMERS AND THEIR USE AS ANTIDANDRUFF AGENTS DNMT1, POLR1C, ETF1 TGM2 3785/4885LPAR1 1706/4885LPAR2 1747/4885
US-10772823-B2 Molecularly imprinted polymer for selectively trapping odorous molecules OR10J3, OR51E2, MSMO1 TGM2 4642/4885LPAR1 3929/4885LPAR2 4231/4885
US-20150320667-A1 MOLECULARLY IMPRINTED POLYMER FOR SELECTIVELY TRAPPING ODOROUS MOLECULES OR10J3, OR51E2, MSMO1 TGM2 4642/4885LPAR1 3929/4885LPAR2 4231/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.