Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2208065 | 0.83 | MEN1 (0.33) | EPHX2MEN1MAPK1KMT2A | |
| SCHEMBL15215840 | 0.83 | POLB (0.31) | — | |
| SCHEMBL16543389 | 0.83 | — | — | |
| SCHEMBL17735904 | 0.81 | — | — | |
| SCHEMBL737596 | 0.81 | ALDH1A1 (0.35) | — | |
| SCHEMBL14466004 | 0.81 | EPHX2 (0.33) | EPHX2MEN1MAPK1KMT2A | |
| SCHEMBL19862666 | 0.80 | CYP17A1 (0.30) | — | |
| SCHEMBL12170588 | 0.80 | DPP4 (0.33) | — | |
| SCHEMBL12153603 | 0.80 | GAA (0.33) | EPHX2 | |
| SCHEMBL12777578 | 0.79 | ELANE (0.44) | EPHX2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9164387-B2 | Pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9164387-B2 | Pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9122163-B2 | — | — | 2015-09-01 | — | — | US | disclosed |
| US-9122163-B2 | — | — | 2015-09-01 | — | — | US | disclosed |
| US-20130224661-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224661-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20090253881-A1 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090253881-A1 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| EP-1882705-A1 | POLYMERIZABLE COMPOUND FOR PHOTORESIST, POLYMER THEREOF, AND PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 2008-01-30 | — | — | EP | disclosed |