SCHEMBL4120854

SCHEMBL4120854

C=C(C)C(=O)OCNC(=O)CC(C)=O

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
ALDH1A1 P00352 2/20 0.43
THRB P10828 1/20 0.41
MGAM O43451 1/20 0.33
GAA P10253 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17676406 0.84 THRB (0.46) TSHRALDH1A1THRBMGAMGAA
SCHEMBL822676 0.81 TSHR (0.48) TSHRALDH1A1THRBMGAMGAA
SCHEMBL14848954 0.81 TSHR (0.46) TSHRALDH1A1THRBGAA
SCHEMBL2531723 0.81 THRB (0.47) TSHRALDH1A1THRBMGAMGAA
SCHEMBL17250046 0.79 THRB (0.48) TSHRALDH1A1THRBMGAMGAA
Nitrous Acid SCHEMBL27663464 0.79 TSHR (0.37) TSHRALDH1A1THRBTDP1
SCHEMBL3987446 0.78 MCL1 (0.48) TSHRALDH1A1THRBGAAHTT
SCHEMBL23746701 0.78 ALDH1A1 (0.50) TSHRALDH1A1THRBMGAMGAA
SCHEMBL6060478 0.78 TSHR (0.45) TSHRALDH1A1THRBMGAMGAA
SCHEMBL11253036 0.77 TSHR (0.48) TSHRALDH1A1THRBMGAMGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7560519-B2 Dual-stage wafer applied underfills LORD CORPORATION (US) 2009-07-14 US claimed
US-9082840-B2 Coating adhesives onto dicing before grinding and micro-fabricated wafers Henkel IP & Holding GmbH (DE) 2015-07-14 US disclosed
US-20140242781-A1 COATING ADHESIVES ONTO DICING BEFORE GRINDING AND MICRO-FABRICATED WAFERS Henkel IP & Holding GmbH (DE) 2014-08-28 US disclosed
US-8791033-B2 Wafer backside coating process with pulsed UV light source Henkel IP & Holding GmbH (DE) 2014-07-29 US disclosed
US-8753959-B2 Coating adhesives onto dicing before grinding and micro-fabricated wafers Henkel IP & Holding GmbH (DE) 2014-06-17 US disclosed
US-20130101856-A1 WAFER BACKSIDE COATING CONTAINING REACTIVE SULFUR COMPOUND HENKEL CORPORATION (US) 2013-04-25 US disclosed
US-20130099396-A1 WAFER BACKSIDE COATING PROCESS WITH PULSED UV LIGHT SOURCE HENKEL CORPORATION (US) 2013-04-25 US disclosed
EP-2580298-A2 WAFER BACKSIDE COATING CONTAINING REACTIVE SULFUR COMPOUND Henkel Corporation (US) 2013-04-17 EP disclosed
US-20130011999-A1 COATING ADHESIVES ONTO DICING BEFORE GRINDING AND MICRO-FABRICATED WAFERS HENKEL CORPORATION (US) 2013-01-10 US disclosed
US-7560519-B2 Dual-stage wafer applied underfills LORD CORPORATION (US) 2009-07-14 US disclosed
EP-0716338-A2 Fine polymer particles having heterogeneous phase structure, silver halide photographic light- sensitive material containing the fine polymer particles and image-forming method FUJI PHOTO FILM CO., LTD. (JP) 1996-06-12 EP disclosed
EP-0679933-A1 Silver halide photographic material and method of processing the same FUJI PHOTO FILM CO., LTD. (JP) 1995-11-02 EP disclosed
US-4512969-A Compositions containing hydrophobic addenda uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1985-04-23 US disclosed
US-4420555-A Photographic materials containing yellow filter dyes EASTMAN KODAK COMPANY (US) 1983-12-13 US disclosed
US-4304769-A PESTICIDES EASTMAN KODAK COMPANY (US) 1981-12-08 US disclosed
US-4247627-A Photographic elements having hydrophilic colloid layers containing hydrophobic ultraviolet absorbers uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1981-01-27 US disclosed
US-4214047-A Photographic elements having hydrophilic colloid layers containing hydrophobic addenda uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1980-07-22 US disclosed
US-4203716-A Photographic elements having hydrophilic colloid layers containing hydrophobic addenda uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1980-05-20 US disclosed
US-4199363-A Processes for achieving uniform, efficient distribution of hydrophobic materials through hydrophilic colloid layers and loaded latex compositions EASTMAN KODAK COMPANY (US) 1980-04-22 US disclosed
US-4133687-A Photographic elements having hydrophilic colloid layers containing compounds having activator precursors and hydrophobic developing agents uniformly loaded in latex polymer particles EASTMAN KODAK COMPANY (US) 1979-01-09 US disclosed