SCHEMBL4130675

SCHEMBL4130675

O=C(OCC1CO1)c1cc2ccccc2cc1C(=O)OCC1CO1

nearest known ligand 0.57

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.51
MGLL Q99685 5/20 0.48
TDP1 Q9NUW8 1/20 0.46
MAPK1 P28482 2/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
ALDH1A1 P00352 1/20 0.45
TP53 P04637 1/20 0.45
CYP3A4 P08684 1/20 0.45
TSHR P16473 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
HIF1A Q16665 1/20 0.45
USP2 O75604 1/20 0.44
MAPT P10636 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19056796 0.94 DHFR (0.47) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL22357201 0.89 ALDH1A1 (0.47) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL21801767 0.86 DHFR (0.59) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL121520 0.86 DHFR (0.59) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL29374975 0.86 DHFR (0.59) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL157854 0.86 DHFR (0.48) DHFRMGLLMAPK1L3MBTL1ALDH1A1
SCHEMBL11143008 0.86 DHFR (0.54) DHFRMGLLTDP1MAPK1L3MBTL1
SCHEMBL9153659 0.83 DHFR (0.60) DHFRMGLLMAPK1L3MBTL1ALDH1A1
SCHEMBL10349642 0.83 HRH3 (0.50) MGLLALDH1A1MAPT
SCHEMBL1715848 0.83 DHFR (0.53) DHFRMGLLTDP1MAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023238920-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT 日産化学株式会社 2023-12-14 WO disclosed
WO-2023182408-A1 COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON 日産化学株式会社 2023-09-28 WO disclosed
WO-2023181960-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2023-09-28 WO disclosed
WO-2023149327-A1 PROTECTIVE FILM FORMING COMPOSITION 日産化学株式会社 2023-08-10 WO disclosed
WO-2023058368-A1 METHOD FOR PRODUCING GLASS SUBSTRATE, PRETREATMENT METHOD FOR GLASS SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER BODY COMPRISING GLASS SUBSTRATE 日産化学株式会社 2023-04-13 WO disclosed
US-20220404706-A1 CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM NISSAN CHEMICAL CORPORATION (JP) 2022-12-22 US disclosed
US-20220153920-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-20220145119-A1 CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT HAVING DIOL STRUCTURE AT TERMINAL THEREOF NISSAN CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-20210403635-A1 CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT OF ARYLENE COMPOUND HAVING GLYCIDYL GROUP NISSAN CHEMICAL CORPORATION (JP) 2021-12-30 US disclosed
WO-2021085397-A1 CHEMICAL-RESISTANT POLYCARBOXYLIC ACID-CONTAINING PROTECTIVE FILM 日産化学株式会社 2021-05-06 WO disclosed
WO-2020166580-A1 METHOD FOR PRODUCING POLYMER 日産化学株式会社 2020-08-20 WO disclosed
EP-3187515-B1 POLYMERIZABLE MONOMER, CURABLE COMPOSITION AND RESIN MEMBER TOKUYAMA DENTAL CORP (JP) 2020-03-18 EP disclosed
US-20170253555-A1 POLYMERIZABLE MONOMER, METHOD OF PRODUCING POLYMERIZABLE MONOMER, CURABLE COMPOSITION AND RESIN MEMBER TOKUYAMA DENTAL CORPORATION (JP) 2017-09-07 US disclosed
EP-3187515-A1 POLYMERIZABLE MONOMER, CURABLE COMPOSITION AND RESIN MEMBER Tokuyama Dental Corporation (JP) 2017-07-05 EP disclosed
EP-1942179-B1 CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME TOYAMA PREFECTURE (JP) 2017-05-10 EP disclosed
US-8664003-B2 Chip provided with film having hole pattern with the use of thermoresponsive polymer and method of producing the same TOYAMA PREFECTURE (JP) 2014-03-04 US disclosed
US-20120301942-A1 CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME TOYAMA PREFECTURE (JP) 2012-11-29 US disclosed
US-20090130384-A1 Chip Provided with film Having Hole Pattern with the Use of Thermoresponsive Polymer and Method of Producing the Same TOYAMA PREFECTURE (JP) 2009-05-21 US disclosed
EP-1942179-A1 CHIP PROVIDED WITH FILM HAVING HOLE PATTERN WITH THE USE OF THERMORESPONSIVE POLYMER AND METHOD OF PRODUCING THE SAME Toyama Prefecture (JP) 2008-07-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170253555-A1 POLYMERIZABLE MONOMER, METHOD OF PRODUCING POLYMERIZABLE MONOMER, CURABLE COMPOSITION AND RESIN MEMBER H1-0, VMP1, CHRM1 DHFR 3104/4885MGLL 3630/4885TDP1 1370/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.