SCHEMBL22357201

SCHEMBL22357201

O=C(OCC1CO1)c1cc2ccccc2cc1OCC1CO1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
GLA P06280 2/20 0.47
TDP1 Q9NUW8 1/20 0.46
DHFR P00374 1/20 0.46
TP53 P04637 1/20 0.45
CYP3A4 P08684 1/20 0.45
TSHR P16473 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
HIF1A Q16665 1/20 0.45
DRD2 P14416 2/20 0.45
DRD4 P21917 2/20 0.45
GAA P10253 2/20 0.43
MAPK1 P28482 2/20 0.43
KDM4E B2RXH2 1/20 0.43
HPGD P15428 1/20 0.43
HSD17B10 Q99714 1/20 0.43
MGLL Q99685 3/20 0.42
LMNA P02545 1/20 0.41
PKM P14618 1/20 0.41
MEN1 O00255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4130675 0.89 DHFR (0.51) ALDH1A1TDP1DHFRTP53CYP3A4
SCHEMBL19056796 0.83 DHFR (0.47) TDP1DHFRTSHRMAPK1MGLL
SCHEMBL10936580 0.83 ALDH1A1 (0.55) ALDH1A1GLATDP1DHFRTP53
SCHEMBL29417585 0.81 TDP1 (0.63) ALDH1A1GLATDP1TP53CYP3A4
SCHEMBL7789651 0.81 TDP1 (0.63) ALDH1A1GLATDP1TP53CYP3A4
SCHEMBL121520 0.79 DHFR (0.59) ALDH1A1TDP1DHFRTSHRMAPK1
SCHEMBL21801767 0.79 DHFR (0.59) ALDH1A1TDP1DHFRTSHRMAPK1
SCHEMBL29374975 0.79 DHFR (0.59) ALDH1A1TDP1DHFRTSHRMAPK1
SCHEMBL11143008 0.78 DHFR (0.54) ALDH1A1TDP1DHFRTP53CYP3A4
SCHEMBL22357198 0.76 ALDH1A1 (0.44) ALDH1A1GLATDP1DHFRTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023238920-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT 日産化学株式会社 2023-12-14 WO disclosed
WO-2023182408-A1 COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON 日産化学株式会社 2023-09-28 WO disclosed
WO-2023181960-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2023-09-28 WO disclosed
WO-2023149327-A1 PROTECTIVE FILM FORMING COMPOSITION 日産化学株式会社 2023-08-10 WO disclosed
US-20220404706-A1 CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM NISSAN CHEMICAL CORPORATION (JP) 2022-12-22 US disclosed
US-20220153920-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-20220145119-A1 CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT HAVING DIOL STRUCTURE AT TERMINAL THEREOF NISSAN CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-20210403635-A1 CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT OF ARYLENE COMPOUND HAVING GLYCIDYL GROUP NISSAN CHEMICAL CORPORATION (JP) 2021-12-30 US disclosed
WO-2021085397-A1 CHEMICAL-RESISTANT POLYCARBOXYLIC ACID-CONTAINING PROTECTIVE FILM 日産化学株式会社 2021-05-06 WO disclosed
WO-2020166580-A1 METHOD FOR PRODUCING POLYMER 日産化学株式会社 2020-08-20 WO disclosed