SCHEMBL4139210

SCHEMBL4139210

C=COC(C)COc1ccc(C2(c3ccc(OCC(C)OC=C)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
KDM4E B2RXH2 2/20 0.40
MAPT P10636 2/20 0.40
OPRK1 P41145 1/20 0.40
PDK2 Q15119 6/20 0.38
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
MAOA P21397 1/20 0.34
PTGS1 P23219 1/20 0.34
NPC1 O15118 2/20 0.33
CYP2D6 P10635 2/20 0.33
MTOR P42345 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
MAPK1 P28482 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2232329 0.82 PDK2 (0.37) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL31132446 0.82 PDK2 (0.37) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL4143022 0.82 ESR1 (0.45) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL4137620 0.80 ESR1 (0.35) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL29441931 0.79 LMNA (0.57) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL8405184 0.79 LMNA (0.57) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL13325393 0.79 LMNA (0.46) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL16063191 0.78 LMNA (0.41) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL4136285 0.78 ESR1 (0.34) LMNAMEN1KMT2ASMN1; SMN2KDM4E
SCHEMBL23239453 0.78 LMNA (0.53) LMNASMN1; SMN2KDM4EMAPTESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090068569-A1 Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium NIPPON PAINT CO., LTD. 2009-03-12 US disclosed