Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SCSF1RDRD2FLT1FLT3FLT4HTR1BHTR1DHTR1FKDRKITMETOPRD1OPRK1OPRM1PDGFRAPDGFRBRET
The experimentally established mechanism targets of Malic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.80 |
| ▸ | SLC22A16 | Q86VW1 | 1/20 | 0.54 |
| ▸ | CPT2 | P23786 | 1/20 | 0.45 |
| ▸ | CPT1A | P50416 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CTSL | P07711 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | HRH1 | P35367 | 1/20 | 0.39 |
| ▸ | CRAT | P43155 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | BBOX1 | O75936 | 3/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malic Acid SCHEMBL1311966 | 0.98 | CA4 (0.76) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL3593172 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL21815634 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL2784551 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL3596014 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL5013575 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL20994738 | 0.87 | — | — | |
| Malic Acid SCHEMBL21815132 | 0.87 | CA4 (1.00) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL674137 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 | |
| Malic Acid SCHEMBL18981017 | 0.87 | CA4 (0.94) | CA4SLC22A16CPT2CPT1ACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140193975-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-10 | — | — | US | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| US-20130280912-A1 | SILICON COMPOUND, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING THE SAME AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-24 | — | — | US | disclosed |
| US-20130059439-A1 | CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-20120299158-A1 | CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-5933693-A | Electroconductive elastic member and electrophotographic apparatus using same | BRIDGESTONE CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5576459-A | Quaternary nitrogen or phosphorus chirates | SACHEM, INC. (US) | 1996-11-19 | — | — | US | disclosed |