SCHEMBL4142999

SCHEMBL4142999

C=CCCS(=O)(=O)NCCc1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(CCNS(=O)(=O)CCC=C)c2F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15283728 0.86 ALDH1A1 (0.30)
SCHEMBL9800050 0.81 MEN1 (0.34)
SCHEMBL31121768 0.78
SCHEMBL9800195 0.77 MTNR1A (0.31)
SCHEMBL2834736 0.75
SCHEMBL2834282 0.75 MTNR1A (0.35)
SCHEMBL9800043 0.74 MC4R (0.31)
SCHEMBL9800152 0.74 MTNR1A (0.35)
SCHEMBL9800023 0.74 RELA (0.31)
SCHEMBL28538181 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025070691-A1 PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND PRINTED WIRING BOARD 太陽ホールディングス株式会社 2025-04-03 WO disclosed
US-20130260109-A1 PHOTOCURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT AND PRINTED WIRING BOARD TAIYO INK MFG. CO., LTD. (JP) 2013-10-03 US disclosed
US-20090068569-A1 Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium NIPPON PAINT CO., LTD. 2009-03-12 US disclosed
EP-1862858-A1 Image bearing member, and process cartridge and image forming apparatus using the same Ricoh Company, Ltd. (JP) 2007-12-05 EP disclosed
US-20070031746-A1 Electrophotographic photoconductor, process cartridge, and image forming method RICOH COMPANY, LTD. (JP) 2007-02-08 US disclosed
US-20050185232-A1 Volume hologram recording photosensitive composition and its use NIPPON PAINT CO., LTD. (JP) 2005-08-25 US disclosed
US-5068371-A Photoinitiators for polymerization CIBA-GEIGY CORPORATION (US) 1991-11-26 US disclosed