Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.72 |
| ▸ | TSHR | P16473 | 3/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.59 |
| ▸ | MEN1 | O00255 | 3/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | THRB | P10828 | 2/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.32 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.32 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL4017515 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Triethylene Glycol SCHEMBL5145504 | 0.97 | ALDH1A1 (0.68) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Triethylene Glycol SCHEMBL5335679 | 0.97 | ALDH1A1 (0.68) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL16595 | 0.94 | ALDH1A1 (0.81) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL1727711 | 0.94 | ALDH1A1 (0.81) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Diethylene Glycol Monoethyl Ether SCHEMBL10882772 | 0.92 | ALDH1A1 (0.78) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Ethylene SCHEMBL28794602 | 0.92 | ALDH1A1 (0.78) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Diethylene Glycol Monoethyl Ether SCHEMBL1618672 | 0.92 | ALDH1A1 (0.78) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL1924542 | 0.91 | ALDH1A1 (0.77) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Triethylene Glycol SCHEMBL15525927 | 0.91 | ALDH1A1 (0.77) | ALDH1A1TSHRMAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060238588-A1 | Ink set, ink jet printer cartridge and ink jet printing apparatus using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-10-26 | — | — | US | claimed |
| US-20230226525-A1 | PLATINUM-TUNGSTEN SOLID SOLUTION PARTICLES AND CATALYST CONTAINING SAME | NIPPON SODA CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| WO-2023127617-A1 | DISPERSANT FOR FLUORORESIN, COMPOSITION, DISPERSION LIQUID, ARTICLE, AND COPOLYMER | 第一工業製薬株式会社 | 2023-07-06 | — | — | WO | disclosed |
| EP-4169611-A1 | PLATINUM-TUNGSTEN SOLID SOLUTION PARTICLES AND CATALYST CONTAINING SAME | Nippon Soda Co., Ltd. (JP) | 2023-04-26 | — | — | EP | disclosed |
| WO-2021256061-A1 | PLATINUM-TUNGSTEN SOLID SOLUTION PARTICLES AND CATALYST CONTAINING SAME | 日本曹達株式会社 | 2021-12-23 | — | — | WO | disclosed |
| CN-111123643-A | Protective composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2020-05-08 | — | — | CN | disclosed |
| US-9511602-B2 | Coating liquid for ink jet and ink jet recording method using the same | SEIKO EPSON CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20150197101-A1 | COATING LIQUID FOR INK JET AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9039823-B2 | Coating liquid for ink jet and ink jet recording method using the same | SEIKO EPSON CORPORATION (JP) | 2015-05-26 | — | — | US | disclosed |
| US-20130029045-A1 | COATING LIQUID FOR INK JET AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120022189-A1 | CLEAR INK COMPOSITION | SEIKO EPSON CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20060255735-A1 | METHOD OF FORMING BANK, METHOD OF FORMING FILM PATTERN, SEMICONDUCTOR DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2006-11-16 | — | — | US | disclosed |
| US-20060238588-A1 | Ink set, ink jet printer cartridge and ink jet printing apparatus using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-10-26 | — | — | US | disclosed |
| US-6720384-B1 | Coating agent comprising at least four components, method for producing same, and use thereof | BASF COATINGS AC (DE) | 2004-04-13 | — | — | US | disclosed |
| US-6653394-B1 | Oligomeric or polymeric binder; polyisocyanate crosslinking agent, and water; curable with actinic light and/or electron beams; storage stability | BASF COATINGS AG (DE) | 2003-11-25 | — | — | US | disclosed |
| US-6534588-B1 | Curable polymer or oligomer; polyol, polyisocyanate crosslinking agent and water; automobile re-finishes | BASF COATINGS AG (DE) | 2003-03-18 | — | — | US | disclosed |
| US-6423150-B1 | HAVING CHEMICAL STRUCTURE >C=N-NH-CO-, BY CONTACTING WITH A MIXTURE OF AN ACID AND WATER TO BREAK CHEMICAL BONDS, THEN REMOVING WITH SOLVENT; CROSSLINKED POLYMER REMOVED CAN BE RECYCLED; PAINTS, ADHESIVES, PRINTS | KANSAI PAINT CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-6250317-B1 | DISSOLVING THE FILM OF A CROSSLINKED RESIN OF A CARBONYL GROUP CONTAINING COMPOUND AND HYDRAZIDE COMPOUND IN A MIXTURE OF ACIDS (ORGANIC AND INORGANIC), WATER, AND SOLVENTS | KANSAI PAINT CO. LTD (JP) | 2001-06-26 | — | — | US | disclosed |