Triethylene Glycol

Triethylene Glycol

SCHEMBL5335679

C=C.CCOCC.OCCOCCOCCO

nearest known ligand 0.68

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Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.68
MEN1 O00255 4/20 0.61
KMT2A Q03164 4/20 0.61
TSHR P16473 3/20 0.56
MAPK1 P28482 2/20 0.56
THRB P10828 2/20 0.52
HTT P42858 1/20 0.52
MAPT P10636 1/20 0.52
USP2 O75604 1/20 0.34
LMNA P02545 1/20 0.34
CYP3A4 P08684 1/20 0.34
CASP1 P29466 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
SLCO1B3 Q9NPD5 1/20 0.34
SLCO1B1 Q9Y6L6 1/20 0.34
APP P05067 4/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triethylene Glycol SCHEMBL5145504 1.00 ALDH1A1 (0.68) ALDH1A1MEN1KMT2ATSHRMAPK1
Di(Hydroxyethyl)Ether SCHEMBL414706 0.97 ALDH1A1 (0.72) ALDH1A1MEN1KMT2ATSHRMAPK1
Di(Hydroxyethyl)Ether SCHEMBL4017515 0.97 ALDH1A1 (0.72) ALDH1A1MEN1KMT2ATSHRMAPK1
Diethylene Glycol Monoethyl Ether SCHEMBL1618672 0.94 ALDH1A1 (0.78) ALDH1A1MEN1KMT2ATSHRMAPK1
Diethylene Glycol Monoethyl Ether SCHEMBL10882772 0.94 ALDH1A1 (0.78) ALDH1A1MEN1KMT2ATSHRMAPK1
Ethylene SCHEMBL28794602 0.94 ALDH1A1 (0.78) ALDH1A1MEN1KMT2ATSHRMAPK1
Triethylene Glycol SCHEMBL55649 0.94 ALDH1A1 (0.77) ALDH1A1MEN1KMT2ATSHRMAPK1
Tetraethylene Glycol SCHEMBL216925 0.94 ALDH1A1 (0.77) ALDH1A1MEN1KMT2ATSHRMAPK1
Triethylene Glycol SCHEMBL18546565 0.94 ALDH1A1 (0.77) ALDH1A1MEN1KMT2ATSHRMAPK1
Triethylene Glycol SCHEMBL15525927 0.94 ALDH1A1 (0.77) ALDH1A1MEN1KMT2ATSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7311394-B2 Ink-jet printing method and ink-jet printing apparatus CANON KABUSHIKI KAISHA (JP) 2007-12-25 US disclosed
US-20060176331-A1 Ink-jet printing method and ink-jet printing apparatus CANON KABUSHIKI KAISHA (JP) 2006-08-10 US disclosed
WO-2004098896-A1 INK-JET PRINTING METHOD AND INK-JET PRINTING APPARATUS CANON KABUSHIKI KAISHA (JP) 2004-11-18 WO disclosed
EP-0784085-B1 Ink composition, pattern forming method, and colour filter TOSHIBA KK (JP) 2004-08-18 EP disclosed
US-6416174-B1 EJECTING INKS; VAPORIZATION SOLVENT KABUSHIKI KAISHA TOSHIBA (JP) 2002-07-09 US disclosed
US-6291022-B1 AGING SILANE COMPOUND IN TWO STEPS UNDER BASIC AND ACIDIC CONDITIONS TO FORM GRANULAR COLLOIDAL SILICA POLYMER CROSSLINKED WITH LINEAR SILOXANE POLYMER, APPLYING TO GLASS, HEATING TO FORM COARSE SILICA LAYER, APPLYING WATER REPELLENT SAMSUNG CORNING CO., LTD. (KR) 2001-09-18 US disclosed
US-6235383-B1 SILICA COATING FORMED BY AGING TETRAETHOXYSILANE SOLUTION IN PRESENCE OF ACID OR BASIC CATALYST; HEAT TREATMENT SAMSUNG CORNING CO., LTD. (KR) 2001-05-22 US disclosed
EP-0784085-A2 Ink composition, pattern forming method, and colour filter KABUSHIKI KAISHA TOSHIBA (JP) 1997-07-16 EP disclosed
US-4517244-A POLYELECTROLYTES, HIGHLY WATER ABSORPTIVE CANON KABUSHIKI KAISHA (JP) 1985-05-14 US disclosed
US-3991040-A Aromatic imidodicarboxylic acid diallyl esters, prepolymers thereof, cured resins thereof, and processes for producing these TEIJIN LIMITED (JA) 1976-11-09 US disclosed
US-3931224-A Aromatic imidodicarboxylic acid diallyl esters, prepolymers thereof, cured resins thereof, and processes for producing these TEIJIN LIMITED (JA) 1976-01-06 US disclosed