Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.59 |
| ▸ | SIRT1 | Q96EB6 | 2/20 | 0.59 |
| ▸ | GLA | P06280 | 1/20 | 0.59 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.59 |
| ▸ | HPGD | P15428 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | SIRT2 | Q8IXJ6 | 3/20 | 0.43 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29688038 | 1.00 | HSD17B10 (0.59) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL79264 | 0.87 | MAOA (0.55) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL30688778 | 0.87 | MAOA (0.55) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL29370052 | 0.87 | MAOA (0.55) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL14677465 | 0.84 | SIRT1 (0.72) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL10378227 | 0.81 | KDM4E (0.54) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL11434161 | 0.81 | KDM4E (0.43) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL12949861 | 0.79 | KDM4E (0.44) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL668167 | 0.79 | MAOA (0.50) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 | |
| SCHEMBL31329296 | 0.79 | MAOA (0.50) | HSD17B10KDM4ECYP1A2CYP2C19SIRT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11767398-B2 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life | MERCK PATENT GMBH (DE) | 2023-09-26 | — | — | US | disclosed |
| US-11767398-B2 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life | MERCK PATENT GMBH (DE) | 2023-09-26 | — | — | US | disclosed |
| US-20220025109-A1 | SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN ALKYNYLOXY SUBSTITUTED SPIN-ON CARBON COMPONENT USEFUL AS HARD MASKS AND FILLING MATERIALS WITH IMPROVED SHELF LIFE | MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) | 2022-01-27 | — | — | US | disclosed |
| US-11137686-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-10-05 | — | — | US | disclosed |
| CN-105859619-B | The method of the ionic liquid-catalyzed multi-component reaction synthesis acridine cyclohexadione compounds of betaines | 河南师范大学 | 2019-01-01 | — | — | CN | disclosed |
| EP-3350190-A1 | BRØNSTED-ACID FLUOROALKYL PHOSPHONATES | Merck Patent GmbH (DE) | 2018-07-25 | — | — | EP | disclosed |
| US-20180074402-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20170240690-A1 | EPOXY RESIN, CURABLE RESIN COMPOSITION, CURED PRODUCT, SEMICONDUCTOR ENCAPSULATING MATERIAL, SEMICONDUCTOR DEVICE, PREPREG, CIRCUIT BOARD, BUILDUP FILM, BUILDUP SUBSTRATE, FIBER-REINFORCED COMPOSITE MATERIAL AND FIBER-REINFORCED MOLDED ARTICLE | DIC CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20170240690-A1 | EPOXY RESIN, CURABLE RESIN COMPOSITION, CURED PRODUCT, SEMICONDUCTOR ENCAPSULATING MATERIAL, SEMICONDUCTOR DEVICE, PREPREG, CIRCUIT BOARD, BUILDUP FILM, BUILDUP SUBSTRATE, FIBER-REINFORCED COMPOSITE MATERIAL AND FIBER-REINFORCED MOLDED ARTICLE | DIC CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| WO-2017045745-A1 | BRØNSTED-ACID FLUOROALKYL PHOSPHONATES | MERCK PATENT GMBH (DE) | 2017-03-23 | — | — | WO | disclosed |
| EP-1043338-A1 | Polymerisation process in a reactor with double coating against scale formation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-10-11 | — | — | EP | disclosed |
| US-6096144-A | TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-6037426-A | POLYMERIZING MONOMER HAVING ETHYLENIC DOUBLE BOND IN POLYMERIZATION VESSEL HAVING BILAYER POLYMER SCALE PREVENTIVE COATING FILM ON INNER WALL SURFACES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| EP-0934955-A1 | Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-11 | — | — | EP | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0872903-A1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | Shin-Etsu Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180074402-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | SLC11A2, ABCC1, FBL | HSD17B10 1280/4885KDM4E 2209/4885CYP1A2 955/4885 |
| US-11137686-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | MLLT1, PRDM9, NAP1L1 | HSD17B10 2039/4885KDM4E 203/4885CYP1A2 2104/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.