SCHEMBL4150119

SCHEMBL4150119

c1ccc2c(c1)[nH]c1cc3ncoc3cc12

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AHR P35869 1/20 0.53
▸ TOP2A P11388 1/20 0.48
▸ ALDH1A1 P00352 2/20 0.45
▸ GPR3 P46089 1/20 0.45
▸ HSD17B10 Q99714 1/20 0.45
▸ GABRP O00591 6/20 0.45
▸ GABRD O14764 6/20 0.45
▸ GABRA1 P14867 6/20 0.45
▸ GABRB1 P18505 6/20 0.45
▸ GABRG2 P18507 6/20 0.45
▸ GABRB3 P28472 6/20 0.45
▸ GABRA5 P31644 6/20 0.45
▸ GABRA3 P34903 6/20 0.45
▸ GABRA2 P47869 6/20 0.45
▸ GABRB2 P47870 6/20 0.45
▸ GABRA4 P48169 6/20 0.45
▸ GABRE P78334 6/20 0.45
▸ GABRA6 Q16445 6/20 0.45
▸ GABRG1 Q8N1C3 6/20 0.45
▸ GABRG3 Q99928 6/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4137851 0.94 AHR (0.53) AHRTOP2AALDH1A1GPR3HSD17B10
Carbazole SCHEMBL546743 0.81 ALDH1A1 (0.50) AHRTOP2AALDH1A1GPR3HSD17B10
SCHEMBL12219476 0.72 AHR (1.00) AHRTOP2AALDH1A1GPR3HSD17B10
SCHEMBL550602 0.72 AHR (1.00) AHRTOP2AALDH1A1GPR3HSD17B10
SCHEMBL12219478 0.72 AHR (1.00) AHRTOP2AALDH1A1GPR3HSD17B10
SCHEMBL29380459 0.72 AHR (1.00) AHRTOP2AALDH1A1GPR3HSD17B10
SCHEMBL5143546 0.71 GPR3 (0.45) ALDH1A1GPR3GABRPGABRDGABRA1
SCHEMBL1636528 0.70 AHR (0.85) AHRALDH1A1GPR3HSD17B10KIF11
SCHEMBL29406398 0.70 AHR (0.85) AHRALDH1A1GPR3HSD17B10KIF11
SCHEMBL12219451 0.70 AHR (0.85) AHRALDH1A1GPR3HSD17B10KIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 — — US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 — — WO disclosed
EP-1061411-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-10-11 — — EP disclosed
EP-1067430-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-09-13 — — EP disclosed
US-20050271987-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-12-08 — — US disclosed
US-6838231-B2 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-04 — — US disclosed
US-20040166450-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2004-08-26 — — US disclosed
US-6780577-B2 A MULTILAYER COMPRISING PHOTOSENSITIVE DYES WITH ABSORPTION SPECTRA AT A HIGH FLUORESCENCE WAVELENGTH FUJI PHOTO FILM CO., LTD. (JP) 2004-08-24 — — US disclosed
US-6730468-B1 ADSORBED ON SURFACE A SENSITIZING DYE IN MULTIPLE LAYERS FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 — — US disclosed
US-6692905-B2 COLOR PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 2004-02-17 — — US disclosed
US-20030180673-A1 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2003-09-25 — — US disclosed
US-20030170575-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. 2003-09-11 — — US disclosed
US-6610466-B2 Exhibits increased light absorption and light absorption intensity and which has sensitizing dyes adsorbed in multilayer form stably even in the presence of an organic solvent. FUJI PHOTO FILM CO., LTD. (JP) 2003-08-26 — — US disclosed
US-6582894-B1 Silver haide photographic emulsion and photographic light-sensitive material using same FUJI PHOTO FILM CO., LTD. (JP) 2003-06-24 — — US disclosed
US-6521401-B1 Spectrally sensitizing with dye that does not have electric charge or forms an inner salt FUJI PHOTO FILM CO., LTD. (JP) 2003-02-18 — — US disclosed
US-20020177087-A1 Silver halide photographic lightsensitive material FUJIFILM CORPORATION (JP) 2002-11-28 — — US disclosed
US-6465166-B1 HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING FUJI PHOTO FILM. CO., LTD. (JP) 2002-10-15 — — US disclosed
US-20020012892-A1 Methine compound-containing silver halide photographic emulsion and photographic material using the same FUJIFILM CORPORATION (JP) 2002-01-31 — — US disclosed
EP-1067430-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-01-10 — — EP disclosed
EP-1061411-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-20 — — EP disclosed
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