Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL4151391

C[N+](C)(C)C.[F-].[F-].[H+]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240102182-A1 METHOD FOR PREPARING SULFURYL FLUORIDE BY ELECTROFLUORINATION CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) 2024-03-28 US claimed
CN-117246982-A Lithium bis (fluorosulfonyl) imide and method for purifying lithium bis (fluorosulfonyl) imide 时代思康新材料有限公司 2023-12-19 CN claimed
CN-117089418-A Substrate treatment composition and substrate treatment method using same SK株式会社 2023-11-21 CN claimed
EP-4276063-A1 METHOD FOR PREPARING SULFURYL FLUORIDE BY ELECTROFLUORINATION Contemporary Amperex Technology Co., Limited (CN) 2023-11-15 EP claimed
WO-2023142047-A1 METHOD FOR PREPARING SULFURYL FLUORIDE BY ELECTROFLUORINATION 宁德时代新能源科技股份有限公司 2023-08-03 WO claimed
CN-114395767-A Preparation method of sulfuryl fluoride by electrofluorination 宁德时代新能源科技股份有限公司 2022-04-26 CN claimed
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US claimed
EP-0662705-B1 Cleaning agent for semiconductor device and method for manufacturing semiconductor device MITSUBISHI GAS CHEMICAL CO (JP) 2000-08-23 EP claimed
EP-0662705-A2 Cleaning agent for semiconductor device and method for manufacturing semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1995-07-12 EP claimed
US-20240102182-A1 METHOD FOR PREPARING SULFURYL FLUORIDE BY ELECTROFLUORINATION CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) 2024-03-28 US disclosed
CN-117089418-A Substrate treatment composition and substrate treatment method using same SK株式会社 2023-11-21 CN disclosed
EP-4276063-A1 METHOD FOR PREPARING SULFURYL FLUORIDE BY ELECTROFLUORINATION Contemporary Amperex Technology Co., Limited (CN) 2023-11-15 EP disclosed
CN-117025316-A Substrate treatment composition and substrate treatment method using same SK株式会社 2023-11-10 CN disclosed
CN-111479842-B Freeze-resistant aqueous coating based on polyisocyanates 科思创德国股份有限公司 2023-09-05 CN disclosed
US-6274770-B1 PARTICULARLY, ALTHOUGH NOT EXCLUSIVELY, RELATES TO THE PREPARATION OF SUBSTITUTED BENZOPHENONE COMPOUNDS, FOR EXAMPLE, 4,4'-DIFLUOROBENZOPHENONE. VICTREX MANUFACTURING LIMITED (GB) 2001-08-14 US disclosed
WO-2001034592-A1 5-HALO-4-FLUORO-4,7,7-TRIMETHYL-3-OXABICYCLO[4.1.0]HEPTANE-2-ONES, METHOD FOR THEIR PRODUCTION AND THEIR USE IN THE PRODUCTION OF CYCLOPROPANE CARBOXYLIC ACIDS AVENTIS CROPSCIENCE GMBH (DE) 2001-05-17 WO disclosed
EP-0662705-B1 Cleaning agent for semiconductor device and method for manufacturing semiconductor device MITSUBISHI GAS CHEMICAL CO (JP) 2000-08-23 EP disclosed
EP-0970033-A1 PROCESS FOR PREPARATION OF AROMATIC COMPOUNDS VICTREX MANUFACTURING LIMITED (GB) 2000-01-12 EP disclosed
WO-1998040338-A1 PROCESS FOR PREPARATION OF AROMATIC COMPOUNDS VICTREX MANUFACTURING LIMITED (GB) 1998-09-17 WO disclosed
EP-0662705-A2 Cleaning agent for semiconductor device and method for manufacturing semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1995-07-12 EP disclosed