⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL3344685 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL3074583 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL3074581 | 0.91 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL3342934 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL28467728 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL4847781 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL4151389 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL4151391 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL63730 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL5493226 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-11274051-A | — | — | None | — | — | JP | disclosed |
| JP-9092655-A | — | — | None | — | — | JP | disclosed |
| EP-2658350-B1 | ORGANIC ELECTROLUMINESCENT ELEMENT | NEC LIGHTING LTD (JP) | 2019-11-13 | — | — | EP | disclosed |
| EP-2477097-B1 | NARROW FRAME TOUCH INPUT SHEET, MANUFACTURING METHOD OF SAME, AND CONDUCTIVE SHEET USED IN NARROW FRAME TOUCH INPUT SHEET | NISSHA PRINTING (JP) | 2018-06-06 | — | — | EP | disclosed |
| US-9891524-B2 | Semiconductor device and method of manufacturing the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2018-02-13 | — | — | US | disclosed |
| US-20160216609-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2016-07-28 | — | — | US | disclosed |
| US-9119272-B2 | Organic electroluminescent element and organic electroluminescent lighting device | NEC LIGHTING, LTD. (JP) | 2015-08-25 | — | — | US | disclosed |
| US-8852852-B2 | Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet | NISSHA PRINTING CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20140001148-A1 | NARROW FRAME TOUCH INPUT SHEET, MANUFACTURING METHOD OF SAME, AND CONDUCTIVE SHEET USED IN NARROW FRAME TOUCH INPUT SHEET | NISSHA PRINTING CO., LTD. (JP) | 2014-01-02 | — | — | US | disclosed |
| US-8581871-B2 | Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet | NISSHA PRINTING CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| JP-H11274051-A | PRE-PROCESSING METHOD FOR PHOTORESIST APPLICATION | TOSHIBA CORP | 1999-10-08 | — | — | JP | disclosed |
| US-5866304-A | USING AN ACRYLATED ACID TERPOLYMER | NEC CORPORATION (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0692554-B1 | Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1999-01-20 | — | — | EP | disclosed |
| EP-0886307-A2 | A through hole formation method and a substrate provided with a through hole | CANON KABUSHIKI KAISHA (JP) | 1998-12-23 | — | — | EP | disclosed |
| US-5846688-A | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5795828-A | Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-08-18 | — | — | US | disclosed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | disclosed |
| JP-H0992655-A | METHOD FOR FORMING ALUMINUM-BASED PATTERN | SONY CORP | 1997-04-04 | — | — | JP | disclosed |
| EP-0742488-A2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-11-13 | — | — | EP | disclosed |
| EP-0692554-A1 | Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-17 | — | — | EP | disclosed |