SCHEMBL4175797

SCHEMBL4175797

CC1(C)OC(=O)CC1C12C=CC(C1)C(C(=O)O)C2

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.34
LMNA P02545 2/20 0.34
USP2 O75604 1/20 0.34
MAPT P10636 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4168454 0.76
SCHEMBL4179239 0.75 POLB (0.32) TSHR
SCHEMBL4163650 0.73
SCHEMBL4170742 0.71
SCHEMBL4164078 0.71
SCHEMBL31533275 0.65 APLNR (0.35) ALDH1A1
SCHEMBL4162941 0.64
SCHEMBL546932 0.63 LMNA (0.59) ALDH1A1LMNAUSP2MAPTHSD17B10
SCHEMBL7048008 0.62 HTR7 (0.36)
SCHEMBL4169863 0.62 LMNA (0.38) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed