Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 4/20 | 0.88 |
| ▸ | LMNA | P02545 | 3/20 | 0.88 |
| ▸ | CES1 | P23141 | 3/20 | 0.88 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.61 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | PARP1 | P09874 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | BLM | P54132 | 1/20 | 0.48 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL28211858 | 0.96 | CES2 (0.88) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28120851 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL145 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL901258 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL10665271 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL27696284 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL2025536 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL5833429 | 0.94 | CES2 (1.00) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL27845663 | 0.92 | CES2 (0.81) | CES2LMNACES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL4527488 | 0.91 | CES2 (0.95) | CES2LMNACES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 474 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4636808-A1 | PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | Nissan Chemical Corporation (JP) | 2025-10-22 | — | — | EP | claimed |
| WO-2024128279-A1 | PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | 日産化学株式会社 | 2024-06-20 | — | — | WO | claimed |
| US-20200201178-A1 | PHOTOCURABLE COMPOSITION HAVING LOW SHRINKAGE AFTER CURING | CANON KABUSHIKI KAISHA (JP) | 2020-06-25 | — | — | US | claimed |
| EP-2640780-B1 | UV CURABLE ANHYDRIDE-MODIFIED POLY(ISOBUTYLENE) | 3M INNOVATIVE PROPERTIES CO (US) | 2018-05-09 | — | — | EP | claimed |
| CN-104530417-B | A kind of multiple functionalized H types polyethyleneglycol derivative and preparation method thereof | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-08 | — | — | CN | claimed |
| CN-104530415-B | A kind of different functionalization Y types polyethyleneglycol derivative, preparation method and its bio-related substance | 厦门赛诺邦格生物科技股份有限公司 | 2017-09-01 | — | — | CN | claimed |
| EP-2820052-B1 | PHOTOBASE GENERATORS AS LATENT IONIC CROSSLINKERS FOR ACRYLIC PRESSURE-SENSITIVE ADHESIVES | 3M INNOVATIVE PROPERTIES CO (US) | 2017-06-14 | — | — | EP | claimed |
| US-20160017073-A1 | PHOTOBASE GENERATORS AS LATENT IONIC CROSSLINKERS FOR ACRYLIC PRESSURE-SENSITIVE ADHESIVES | 3M INNOVATIVE PROPERTIES COMPANY | 2016-01-21 | — | — | US | claimed |
| US-9238702-B1 | Photobase generators as latent ionic crosslinkers for acrylic pressure-sensitive adhesives | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2016-01-19 | — | — | US | claimed |
| EP-2960280-A1 | Photocrosslinkable compositions, patterned high k thin film dielectrics and related devices | E.T.C. S.r.l. (IT) | 2015-12-30 | — | — | EP | claimed |
| US-20050126697-A1 | Photochemically and thermally curable adhesive formulations | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-06-16 | — | — | US | claimed |
| US-6096483-A | ULTRAVIOLET RADIATION BASE-GENERATING SUBSTANCE; SILOXANE POLYMER HAVING SILICON-HYDROGEN BONDS CAPABLE OF REACTING WITH HYDROXY GROUPS UNDER THE EFFECT OF THE BASE TO FORM SILICON-OXYGEN BONDS AND HYDROGEN; AND ACID; STORAGE STABLE | DOW CORNING ASIA, LTD. (JP) | 2000-08-01 | — | — | US | claimed |
| EP-0725106-B1 | Radiation curable compositions | DOW CORNING ASIA LTD (JP) | 1999-11-03 | — | — | EP | claimed |
| EP-0555749-B1 | Radiation sensitive compositions and processes | SHIPLEY CO (US) | 1999-05-19 | — | — | EP | claimed |
| US-5891529-A | Radiation curable sompositions | DOW CORNING ASIA, LTD. (JP) | 1999-04-06 | — | — | US | claimed |
| US-5789460-A | Radiation curable compositions | DOW CORNING ASIA, LTD. (JP) | 1998-08-04 | — | — | US | claimed |
| EP-0798341-A1 | Radiation-curable composition and method for manufacturing cured-product patterns therefrom | DOW CORNING ASIA, Ltd. (JP) | 1997-10-01 | — | — | EP | claimed |
| EP-0725106-A2 | Radiation curable compositions | DOW CORNING ASIA, Ltd. (JP) | 1996-08-07 | — | — | EP | claimed |
| EP-0555749-A1 | Radiation sensitive compositions and processes | SHIPLEY COMPANY INC. (US) | 1993-08-18 | — | — | EP | claimed |
| EP-0425142-A2 | Positive acting photoresist and method of producing same | ROHM AND HAAS COMPANY (US) | 1991-05-02 | — | — | EP | claimed |