Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.58 |
| ▸ | CES2 | O00748 | 1/20 | 0.58 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.58 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.50 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | FNTA | P49354 | 1/20 | 0.48 |
| ▸ | FNTB | P49356 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.47 |
| ▸ | PAM | P19021 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL11497452 | 0.98 | CES1 (0.56) | CES1CES2AKR1B1CTBP2MEN1 | |
| SCHEMBL27564061 | 0.98 | CES1 (0.56) | CES1CES2AKR1B1CTBP2MEN1 | |
| Hydrochloric Acid SCHEMBL27862997 | 0.98 | CES1 (0.56) | CES1CES2AKR1B1CTBP2MEN1 | |
| SCHEMBL11412460 | 0.92 | CES1 (0.50) | CES1CES2AKR1B1CTBP2MEN1 | |
| Methacrylic Acid SCHEMBL4625270 | 0.92 | CES1 (0.50) | CES1CES2AKR1B1CTBP2MEN1 | |
| SCHEMBL3426193 | 0.90 | CA2 (0.46) | CES1CES2AKR1B1CTBP2FNTA | |
| Benzoic Acid SCHEMBL30610342 | 0.90 | TSHR (0.54) | CES1CES2AKR1B1CTBP2MEN1 | |
| SCHEMBL36672 | 0.87 | LMNA (0.64) | MEN1KMT2AALDH1A1TSHRABCC4 | |
| SCHEMBL29506212 | 0.87 | CES1 (0.50) | CES1CES2AKR1B1CTBP2MEN1 | |
| SCHEMBL3423556 | 0.86 | CTBP2 (0.44) | CES1CES2AKR1B1CTBP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3668 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4724508-A1 | COATING COLOR COMPOSITION | Coatex (FR) | 2026-04-15 | — | — | EP | claimed |
| EP-4709888-A1 | ORE FILTRATION | Coatex (FR) | 2026-03-18 | — | — | EP | claimed |
| US-12428501-B2 | Method for producing removable pressure-sensitive adhesives (PSAs) using bio-based starting materials | THE UNIVERSITY OF THE BASQUE COUNTRY (ES) | 2025-09-30 | — | — | US | claimed |
| US-12410333-B2 | Inkjet ink | NORITAKE CO., LIMITED (JP) | 2025-09-09 | — | — | US | claimed |
| US-20250257160-A1 | FLUOROPOLYMER, CONDUCTIVE SLURRY, POSITIVE ELECTRODE PLATE, SECONDARY BATTERY AND ELECTRICAL APPARATUS | CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) | 2025-08-14 | — | — | US | claimed |
| EP-4592325-A1 | FLUOROPOLYMER, CONDUCTIVE PASTE, POSITIVE ELECTRODE PIECE, SECONDARY BATTERY AND ELECTRICAL APPARATUS | Contemporary Amperex Technology (Hong Kong) Limited (HK) | 2025-07-30 | — | — | EP | claimed |
| US-12371580-B2 | Radiation curable inkjet inks | AGFA NV (BE) | 2025-07-29 | — | — | US | claimed |
| US-12329878-B2 | Material for the manufacturing of ophthalmic implants by photo-polymerization method | LIMITED LIABILITY COMPANY ENTERPRISE “REPER-NN” (RU) | 2025-06-17 | — | — | US | claimed |
| US-20250171660-A1 | WATERBORNE BIODEGRADABLE POLYMER COMPOSITION | ORGANIK KIMYA SANAYI VE TIC. A.S. | 2025-05-29 | — | — | US | claimed |
| CN-119912445-A | Organic compound and amphiphilic polymer and application thereof | 湖南理工学院 | 2025-05-02 | — | — | CN | claimed |
| US-4443588-A | THERMOSETTING, UNSATURATED URETHANE | TORAY INDUSTRIES, INC. (JP) | 1984-04-17 | — | — | US | claimed |
| US-4430419-A | METHACRYLIC ACID-PHENYL METHACRYLATE COPOLYMER, CROSSLINKING, ELECTRONS, X-RAYS, LATENT IMAGES, DEVELOPMENT | NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) | 1984-02-07 | — | — | US | claimed |
| EP-0059561-A1 | Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom | TORAY INDUSTRIES, INC. (JP) | 1982-09-08 | — | — | EP | claimed |
| US-4306780-A | Highly refractive copolymer of an ethylinically unsaturated alkylene oxide of bis-phenol-A and an ethylinically unsaturated aromatic compound for lens and a lens prepared therefrom | HOYA LENS CORPORATION (JP) | 1981-12-22 | — | — | US | claimed |
| US-4256873-A | CATALYTICALLY REACTING FINE SILICA AND A POLYHYDROXIDE TO PRODUCE AN ORGANIC HYDROXY SILICATE WHICH CAN MODIFY RESINS OF POLYURETHANE, -ESTERS, ETHERS, AND ADDITION POLYMERS; TOUGH PROTECTIVE COATINGS; FOAMS | BLOUNT DAVID H | 1981-03-17 | — | — | US | claimed |
| US-4201702-A | Process to produce allyl halides copolymers | BLOUNT DAVID H | 1980-05-06 | — | — | US | claimed |
| US-4113693-A | Process for the production of acrylic compounds and resinous products | BLOUNT DAVID H | 1978-09-12 | — | — | US | claimed |
| US-4072770-A | U.V. curable poly(ester-urethane) polyacrylate polymers and wet look coatings therefrom | SCM CORPORATION (US) | 1978-02-07 | — | — | US | claimed |
| US-4065587-A | U.V. Curable poly(ether-urethane) polyacrylates and wet-look polymers prepared therefrom | SCM CORPORATION (US) | 1977-12-27 | — | — | US | claimed |
| US-4011253-A | PROCESS FOR THE PRODUCTION OF SILICIC ACRYLATE COMPOUNDS AND RESINOUS PRODUCTS | BLOUNT DAVID H | 1977-03-08 | — | — | US | claimed |