SCHEMBL4196948

SCHEMBL4196948

C=COC1CCC2CCCCC2C1

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13018444 0.81
SCHEMBL4111350 0.78 ALDH1A1 (0.35) ALDH1A1
SCHEMBL9859429 0.78
SCHEMBL10084903 0.74
SCHEMBL4434587 0.74
SCHEMBL15858060 0.74 CA1 (0.32)
SCHEMBL13888308 0.74
SCHEMBL13705719 0.74
SCHEMBL412194 0.73
SCHEMBL804962 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822592-B2 Aqueous emulsion polymer as dispersant BASF SE (DE) 2014-09-02 US disclosed
US-7858670-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2010-12-28 US disclosed
US-7858670-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2010-12-28 US disclosed
US-20100026771-A1 INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2010-02-04 US disclosed
US-20100026771-A1 INKJET RECORDING METHOD, INKJET RECORDING SYSTEM, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2010-02-04 US disclosed
US-20090234062-A1 Aqueous emulsion polymer as dispersant CIBA SPECIALTY CHEMICALS CORP. 2009-09-17 US disclosed
EP-1444302-B1 LEVELLING AGENT AND ANTI-CRATERING AGENT CIBA HOLDING INC (CH) 2009-06-17 EP disclosed
US-7473720-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2009-01-06 US disclosed
US-7473720-B2 Photosensitive inkjet ink TOSHIBA TEC KABUSHIKI KAISHA (JP) 2009-01-06 US disclosed
US-7375145-B2 capable of overcoming the problems such as poor cation polymerizing reaction and solvent resistance which are particularly accompanied with the conventional photosensitive inkjet ink containing, as a main component, a vinyl ether compound TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-05-20 US disclosed
US-20070101898-A1 Inkjet ink AKIYAMA RYOZO 2007-05-10 US disclosed
US-7173084-B2 Levelling agent and anti-cratering agent EFKA ADDITIVES B.V. (NL) 2007-02-06 US disclosed
EP-1562696-B1 AQUEOUS EMULSION POLYMER AS DISPERSANT CIBA SC HOLDING AG (CH) 2006-03-29 EP disclosed
EP-1562696-A2 AQUEOUS EMULSION POLYMER AS DISPERSANT Efka Additives B.V. (NL) 2005-08-17 EP disclosed
US-20040236007-A1 Levelling agent and anti-cratering agent CIBA SPECIALTY CHEMICALS CORPORATION 2004-11-25 US disclosed
EP-1444302-A1 LEVELLING AGENT AND ANTI-CRATERING AGENT Efka Additives B.V. (NL) 2004-08-11 EP disclosed
WO-2004045755-A2 AQUEOUS EMULSION POLYMER AS DISPERSANT EFKA ADDITIVES B.V. (NL) 2004-06-03 WO disclosed
WO-2003033603-A1 LEVELLING AGENT AND ANTI-CRATERING AGENT EFKA ADDITIVES B.V. (NL) 2003-04-24 WO disclosed
US-4075237-A Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof GEIGY CHEMICAL CORPORATION (US) 1978-02-21 US disclosed
US-3949136-A OIL REPELLENTS, WATERPROOFING TEXTILES CIBA-GEIGY AG (CH) 1976-04-06 US disclosed