⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18817990 | 0.72 | — | — | |
| SCHEMBL26978251 | 0.72 | — | — | |
| SCHEMBL3746557 | 0.72 | — | — | |
| SCHEMBL720869 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL21248713 | 0.72 | — | — | |
| SCHEMBL23830001 | 0.72 | — | — | |
| SCHEMBL27997137 | 0.71 | — | — | |
| SCHEMBL2234886 | 0.68 | — | — | |
| SCHEMBL809124 | 0.68 | CTSD (0.35) | — | |
| Hydrochloric Acid SCHEMBL2233506 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7635441-B2 | Raw material for forming a strontium-containing thin film and process for preparing the raw material | KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO (JP) | 2009-12-22 | — | — | US | claimed |
| US-20090001618-A1 | RAW MATERIAL FOR FORMING A STRONTIUM-CONTAINING THIN FILM AND PROCESS FOR PREPARING THE RAW MATERIAL | KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO (JP) | 2009-01-01 | — | — | US | claimed |
| US-7635441-B2 | Raw material for forming a strontium-containing thin film and process for preparing the raw material | KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO (JP) | 2009-12-22 | — | — | US | disclosed |
| US-20090001618-A1 | RAW MATERIAL FOR FORMING A STRONTIUM-CONTAINING THIN FILM AND PROCESS FOR PREPARING THE RAW MATERIAL | KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO (JP) | 2009-01-01 | — | — | US | disclosed |