SCHEMBL720869

SCHEMBL720869

CCCC1=C([Ba]C2=C(CCC)C(C)=C(C)C2(C)C)C(C)(C)C(C)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4197787 0.72
SCHEMBL26978251 0.71
Hydrochloric Acid SCHEMBL21248713 0.71
SCHEMBL3746557 0.71
SCHEMBL18817990 0.71
SCHEMBL23830001 0.71
SCHEMBL27997137 0.69
SCHEMBL4878222 0.69 CTSD (0.33)
SCHEMBL2234886 0.67
Hydrochloric Acid SCHEMBL2233506 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4538248-A1 COMPOUND Pilkington Group Limited (GB) 2025-04-16 EP claimed
EP-4538249-A1 COMPOUND Pilkington Group Limited (GB) 2025-04-16 EP claimed
US-20240124351-A1 Compound THE UNIVERSITY OF LIVERPOOL (GB) 2024-04-18 US claimed
US-20240124308-A1 Compound THE UNIVERSITY OF LIVERPOOL (GB) 2024-04-18 US claimed
US-20140295071-A1 PRECURSOR COMPOSITIONS FOR ATOMIC LAYER DEPOSITION AND CHEMICAL VAPOR DEPOSITION OF TITANATE, LANTHANATE, AND TANTALATE DIELECTRIC FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-10-02 US claimed
WO-2009020888-A1 STRONTIUM AND BARIUM PRECURSORS FOR USE IN CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION AND RAPID VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2009-02-12 WO claimed
EP-0965602-B1 Groups 2 and 13 based catalyst composition for preparing high-syndiotacticity polystyrene from styrene or other acryl ethylene monomers and process using the same IND TECH RES INST (TW) 2002-05-02 EP claimed
US-20260031365-A1 ELECTROCATALYST STRUCTURES FOR AN ELECTRODE UNIV WEST VIRGINIA (US) 2026-01-29 US disclosed
EP-4538249-A1 COMPOUND Pilkington Group Limited (GB) 2025-04-16 EP disclosed
EP-4538248-A1 COMPOUND Pilkington Group Limited (GB) 2025-04-16 EP disclosed
US-20240124308-A1 Compound THE UNIVERSITY OF LIVERPOOL (GB) 2024-04-18 US disclosed
US-20240124351-A1 Compound THE UNIVERSITY OF LIVERPOOL (GB) 2024-04-18 US disclosed
US-20220320526-A1 ELECTROCATALYST STRUCTURES FOR AN ELECTRODE WEST VIRGINIA UNIVERSITY 2022-10-06 US disclosed
EP-2218754-A1 POLYIMIDE COMPOSITE MATERIAL AND FILM OF THE SAME Mitsui Chemicals, Inc. (JP) 2010-08-18 EP disclosed
WO-2009020888-A1 STRONTIUM AND BARIUM PRECURSORS FOR USE IN CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION AND RAPID VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2009-02-12 WO disclosed
EP-1983073-A1 Metal precursor solutions for chemical vapor deposition Air Products and Chemicals, Inc. (US) 2008-10-22 EP disclosed
US-20080254218-A1 Metal Precursor Solutions For Chemical Vapor Deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-10-16 US disclosed
EP-0965602-B1 Groups 2 and 13 based catalyst composition for preparing high-syndiotacticity polystyrene from styrene or other acryl ethylene monomers and process using the same IND TECH RES INST (TW) 2002-05-02 EP disclosed
US-6211106-B1 Groups IIA and IIIA based catalyst composition for preparing high-syndiotacticity polystyrene INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2001-04-03 US disclosed
EP-0965602-A1 Groups 2 and 13 based catalyst composition for preparing high-syndiotacticity polystyrene from styrene or other acryl ethylene monomers and process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1999-12-22 EP disclosed