SCHEMBL4199462

SCHEMBL4199462

C=C(C)C(=O)OCC(=O)OC1(CC)CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.37
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4194278 0.98 THRB (0.38) THRBTSHRALDH1A1
SCHEMBL14982810 0.97 THRB (0.35) THRBTSHRALDH1A1
SCHEMBL14982809 0.88 THRB (0.49) THRBTSHRALDH1A1
SCHEMBL17247225 0.87 THRB (0.36) THRBTSHRALDH1A1
SCHEMBL17247247 0.87 THRB (0.36) THRBTSHRALDH1A1
SCHEMBL14982798 0.85 THRB (0.41) THRBTSHRALDH1A1
SCHEMBL17247245 0.85 THRB (0.37) THRBTSHRALDH1A1
SCHEMBL14370446 0.85
SCHEMBL4544316 0.84 ALDH1A1 (0.35) THRBTSHRALDH1A1
SCHEMBL686077 0.84 ALDH1A1 (0.35) THRBTSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241441-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-9023580-B2 Method of forming polymeric compound, resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-05-05 US disclosed
US-20130137049-A1 METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-30 US disclosed
US-7556908-B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-07 US disclosed
US-20050266351-A1 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2005-12-01 US disclosed