Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4544316 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47306 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL4544299 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL28137753 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL133202 | 1.00 | ALDH1A1 (0.35) | ALDH1A1THRBTSHR | |
| SCHEMBL47303 | 0.98 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL27927215 | 0.94 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR | |
| SCHEMBL673334 | 0.90 | ALDH1A1 (0.39) | ALDH1A1THRBTSHR | |
| Acrylic Acid SCHEMBL31420446 | 0.89 | LMNA (0.31) | ALDH1A1THRBTSHR | |
| SCHEMBL21338913 | 0.87 | ALDH1A1 (0.37) | ALDH1A1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106980235-A | Chemically amplified photoresist composition and process for its use and its application method | 国际商业机器公司 | 2017-07-25 | — | — | CN | claimed |
| CN-102472971-B | chemically amplified photoresist composition and method of use thereof | 国际商业机器公司 | 2016-12-07 | — | — | CN | claimed |
| CN-119882351-A | High-adhesion positive KrF photoresist resin composition | 万华化学集团股份有限公司 | 2025-04-25 | — | — | CN | disclosed |
| WO-2024005049-A1 | COMPOSITION, RESIN COMPOSITION, FILM FORMATION COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | 三菱瓦斯化学株式会社 | 2024-01-04 | — | — | WO | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-08 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| CN-115725015-A | KrF resin, process for producing the same, and chemically amplified photoresist | 阜阳欣奕华材料科技有限公司 | 2023-03-03 | — | — | CN | disclosed |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-15 | — | — | US | disclosed |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-08-18 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110201823-A1 | SALT AND PROCESS FOR PRODUCING ACID GENERATOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| WO-2011062168-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR株式会社 (JP) | 2011-05-26 | — | — | WO | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | HAX1, BRIX1, RXRA | ALDH1A1 2800/4885THRB 3343/4885TSHR 1050/4885 |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | PHOSPHO1, RER1, RIF1 | ALDH1A1 3361/4885THRB 1590/4885TSHR 813/4885 |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MCCC2, MMAB, INTS9 | ALDH1A1 1392/4885THRB 551/4885TSHR 502/4885 |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | PYM1, MMAB, MEN1 | ALDH1A1 1455/4885THRB 941/4885TSHR 672/4885 |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | ALDH1A1 2800/4885THRB 3343/4885TSHR 1050/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | ALDH1A1 2800/4885THRB 3343/4885TSHR 1050/4885 |
| US-20110201823-A1 | SALT AND PROCESS FOR PRODUCING ACID GENERATOR | FGFR1, MTX1, RER1 | ALDH1A1 2214/4885THRB 3600/4885TSHR 1890/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | ALDH1A1 1376/4885THRB 3769/4885TSHR 3451/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.