SCHEMBL422082

SCHEMBL422082

N=C(N)SCCCS(=O)(=O)O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.52
CYP2C19 P33261 3/20 0.52
LMNA P02545 3/20 0.52
NOS1 P29475 5/20 0.50
HRH4 Q9H3N8 4/20 0.50
NOS3 P29474 3/20 0.50
NOS2 P35228 3/20 0.50
ALDH1A1 P00352 4/20 0.45
TDP1 Q9NUW8 3/20 0.45
HRH2 P25021 1/20 0.45
MAPT P10636 3/20 0.44
APP P05067 1/20 0.44
TSHR P16473 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CYP3A4 P08684 1/20 0.43
APEX1 P27695 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
KDM4E B2RXH2 1/20 0.39
CYP2D6 P10635 1/20 0.39
BLM P54132 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22834187 0.98 CYP1A2 (0.50) CYP1A2CYP2C19LMNANOS1HRH4
SCHEMBL5070049 0.86 LMNA (0.61) CYP1A2CYP2C19LMNANOS1HRH4
SCHEMBL20598830 0.79 LMNA (0.48) CYP1A2CYP2C19LMNANOS1HRH4
SCHEMBL5317979 0.78 APP (0.44) CYP1A2CYP2C19LMNAAPPBLM
SCHEMBL7831490 0.78 APP (0.39) CYP2C19LMNANOS1NOS3NOS2
SCHEMBL6819541 0.75 APP (0.41) CYP2C19LMNAALDH1A1MAPTAPP
Guanidine SCHEMBL11566422 0.74 APP (0.44) CYP2C19LMNAALDH1A1MAPTAPP
Sulfuric Acid SCHEMBL11528486 0.74 NOS1 (0.67) CYP1A2CYP2C19LMNANOS1HRH4
Bromide SCHEMBL8582620 0.73 HRH4 (0.77) CYP1A2CYP2C19LMNANOS1HRH4
SCHEMBL9193111 0.73 CYP1A2 (0.71) CYP1A2CYP2C19LMNANOS1HRH4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 360 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4381120-A1 COMPOSITIONS AND METHODS FOR THE ELECTRODEPOSITION OF NANOTWINNED COPPER MacDermid Enthone Inc. (US) 2024-06-12 EP claimed
WO-2023014524-A1 COMPOSITIONS AND METHODS FOR THE ELECTRODEPOSITION OF NANOTWINNED COPPER MACDERMID ENTHONE INC. (US) 2023-02-09 WO claimed
CN-109863261-B Defect-free filling method of through silicon via and copper plating solution used for filling method 韩国生产技术研究院 2021-08-20 CN claimed
US-20200330931-A1 FUNCTIONALIZED SILICON NANOMEMBRANES AND USES THEREOF SIMPORE INC. 2020-10-22 US claimed
CN-107635676-B Pretreatment method for electroless plating 麦克德米德股份有限公司 2020-09-18 CN claimed
CN-106011802-B Electroless nickel plating bath and electroless nickel plating method using the same 上村工业株式会社 2019-12-13 CN claimed
WO-2019136398-A1 FUNCTIONALIZED SILICON NANOMEMBRANES AND USES THEREOF SIMPORE INC. (US) 2019-07-11 WO claimed
US-20180355499-A1 MANUFACTURING METHOD OF ULTRA-LARGE COPPER GRAINS WITHOUT HEAT TREATMENT LHTECH CO., LTD. (TW) 2018-12-13 US claimed
US-10006135-B2 Electroplating bath and method for producing dark chromium layers Atotech Deutschland LLP (US) 2018-06-26 US claimed
EP-3297772-A1 METHOD OF PRETREATMENT FOR ELECTROLESS PLATING MacDermid, Incorporated (US) 2018-03-28 EP claimed
US-20040074778-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. (US) 2004-04-22 US claimed
US-20030102226-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-06-05 US claimed
US-20030085132-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-05-08 US claimed
EP-1308541-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Company LLC (US) 2003-05-07 EP claimed
US-20030066756-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-10 US claimed
EP-1300486-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
EP-1300487-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
EP-1300488-A2 Plating path and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
EP-1029329-A1 CONDUCTIVE POLYMER COMPOSITIONS Corning Communications Limited (GB) 2000-08-23 EP claimed
WO-1999024991-A1 CONDUCTIVE POLYMER COMPOSITIONS CORNING COMMUNICATIONS LIMITED (GB) 1999-05-20 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200330931-A1 FUNCTIONALIZED SILICON NANOMEMBRANES AND USES THEREOF EPCAM, SELE, L1CAM CYP1A2 4452/4885CYP2C19 4634/4885LMNA 1763/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.