Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | ACHE | P22303 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA7 | P43166 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL31555343 | 0.98 | TSHR (0.41) | TSHRACHELMNAALOX12ALDH1A1 | |
| Bromide SCHEMBL3135269 | 0.98 | TSHR (0.41) | TSHRACHELMNAALOX12ALDH1A1 | |
| Iodide SCHEMBL6129788 | 0.98 | TSHR (0.41) | TSHRACHELMNAALOX12ALDH1A1 | |
| SCHEMBL7646743 | 0.95 | TSHR (0.43) | TSHRACHELMNAALOX12ALDH1A1 | |
| Perchlorate SCHEMBL3139802 | 0.91 | ACHE (0.36) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL3141108 | 0.91 | ACHE (0.39) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL3137533 | 0.88 | TSHR (0.33) | TSHRACHE | |
| SCHEMBL13158723 | 0.88 | ACHE (0.37) | TSHRACHELMNAALDH1A1 | |
| SCHEMBL3136160 | 0.88 | TSHR (0.33) | TSHRACHE | |
| SCHEMBL8597282 | 0.84 | HPGD (0.32) | TSHRACHECYP3A4CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 603 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9058935-B2 | Compounds containing alkyl-cyano-borate or alkyl-cyano-fluoroborate anions | MERC PATENT GMBH (DE) | 2015-06-16 | — | — | US | claimed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | claimed |
| EP-0611813-B1 | One-component air-activatable polymerisable compositions containing onium salts | LOCTITE IRELAND LTD (IE) | 1998-12-30 | — | — | EP | claimed |
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11970596-B2 | Photopolymerizable compositions and reaction products thereof | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2024-04-30 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| EP-1002817-B1 | Photocurable composition | SHOWA DENKO KK (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-0915136-B1 | Photocurable paint composition for road markings | SHOWA DENKO KK (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-6656660-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-12-02 | — | — | US | disclosed |
| US-6486225-B1 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2002-11-26 | — | — | US | disclosed |
| US-6211260-B1 | MARKING ROADS WITH CURABLE PAINT, FILLERS, GLASS BEADS, CATIONIC DYES AND QUATERNARY ORGANIC BORATES | SHOWA DENKO K.K. (JP) | 2001-04-03 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| EP-1024406-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 2000-08-02 | — | — | EP | disclosed |
| EP-1002817-A2 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-05-24 | — | — | EP | disclosed |
| EP-0915136-A1 | Photocurable paint composition for road markings | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1999-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | TSHR 847/4885ACHE 3889/4885LMNA 4690/4885 |
| US-11970596-B2 | Photopolymerizable compositions and reaction products thereof | CBR1, CBR3, POLL | TSHR 2948/4885ACHE 4637/4885LMNA 1974/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | TSHR 1113/4885ACHE 4355/4885LMNA 3803/4885 |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, H1-0, CA7 | TSHR 63/4885ACHE 4081/4885LMNA 4757/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.