Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 5/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.32 |
| ▸ | GPR84 | Q9NQS5 | 4/20 | 0.32 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.31 |
| ▸ | CNR2 | P34972 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL429771 | 1.00 | TDP1 (0.44) | TDP1MAPTSPHK1FAAHPTPN1 | |
| SCHEMBL426341 | 0.94 | TDP1 (0.46) | TDP1MAPTHSD17B10 | |
| SCHEMBL429420 | 0.94 | TDP1 (0.46) | TDP1MAPTHSD17B10 | |
| SCHEMBL429521 | 0.94 | MAPT (0.41) | TDP1MAPTSPHK1PTPN1ZDHHC7 | |
| SCHEMBL17654662 | 0.89 | TDP1 (0.38) | TDP1 | |
| SCHEMBL4314541 | 0.87 | TDP1 (0.49) | TDP1HSD17B10 | |
| SCHEMBL432085 | 0.87 | TDP1 (0.39) | TDP1MAPTHSD17B10 | |
| SCHEMBL4321415 | 0.81 | TDP1 (0.46) | TDP1MAPTHSD17B10LMNA | |
| SCHEMBL15970081 | 0.81 | MAPT (0.41) | TDP1MAPTSPHK1PTPN1GPR84 | |
| SCHEMBL428361 | 0.80 | TDP1 (0.47) | TDP1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12252587-B2 | Curable resin composition, thin film, and color conversion panel and display device including thin film | SAMSUNG SDI CO., LTD. (KR) | 2025-03-18 | — | — | US | disclosed |
| US-20240142874-A1 | NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-05-02 | — | — | US | disclosed |
| CN-115551934-B | Curable resin composition, cured film prepared therefrom, and electronic device comprising cured film | 三星SDI株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-115109413-B | Curable resin composition, film, color conversion panel, and display device | 三星SDI株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-115551934-A | Curable resin composition, cured film formed therefrom, and electronic device having cured film | 三星SDI株式会社 | 2022-12-30 | — | — | CN | disclosed |
| US-20220306809-A1 | CURABLE RESIN COMPOSITION, THIN FILM, AND COLOR CONVERSION PANEL AND DISPLAY DEVICE INCLUDING THIN FILM | SAMSUNG SDI CO., LTD. (KR) | 2022-09-29 | — | — | US | disclosed |
| CN-115109413-A | Curable resin composition, film, color conversion panel, and display device | 三星SDI株式会社 | 2022-09-27 | — | — | CN | disclosed |
| US-20220179138-A1 | WAVELENGTH CONVERSION MEMBER AND UTILIZATION THEREOF, BACKLIGHT UNIT AND IMAGE DISPLAY DEVICE | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| CN-108391449-B | Method for manufacturing semiconductor element and method for manufacturing solar cell | 东丽株式会社 | 2022-05-17 | — | — | CN | disclosed |
| CN-113557456-A | Wavelength conversion member, application thereof, backlight unit and image display device | 昭和电工材料株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-20120021190-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20110256658-A1 | METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-10-20 | — | — | US | disclosed |
| US-20110195541-A1 | COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL | HITACHI CHEMICAL COMPANY, LTD. | 2011-08-11 | — | — | US | disclosed |
| EP-2348546-A2 | Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell | Hitachi Chemical Co., Ltd. (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-20100102321-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |